In-situ thermal stability analysis of amorphous carbon films with different sp3 content

Carbon ◽  
2018 ◽  
Vol 130 ◽  
pp. 401-409 ◽  
Author(s):  
Mehdi Rouhani ◽  
Franklin Chau-Nan Hong ◽  
Yeau-Ren Jeng
Keyword(s):  
Thermal Stability ◽  
Stability Analysis ◽  
Amorphous Carbon ◽  
Carbon Films ◽  
Amorphous Carbon Films

Amorphous Carbon Films In Situ Formed From PTFE Transfer Layer in Solid Lubricated Cryogenic Turbopump Bearings

2019 ◽  
Vol 62 (4) ◽  
pp. 603-613 ◽  
Author(s):  
Ming Hu ◽  
Xiaoming Gao ◽  
Peng Wang ◽  
Yanlong Fu ◽  
Jiayi Sun ◽  
...  
Keyword(s):  
Amorphous Carbon ◽  
Carbon Films ◽  
Transfer Layer ◽  
Amorphous Carbon Films

In situ surface modification and growth of ultrasmooth amorphous carbon films by direct carbon ion-beam deposition

1999 ◽  
Vol 14 (6) ◽  
pp. 2668-2673 ◽  
Author(s):  
M. H. Sohn ◽  
S. I. Kim
Keyword(s):  
Surface Roughness ◽  
Surface Modification ◽  
Amorphous Carbon ◽  
Ion Beam ◽  
Carbon Film ◽  
Carbon Films ◽  
Wear Testing ◽  
Amorphous Carbon Films ◽  
Carbon Ion

Very thin (<,100 nm) amorphous carbon films were grown on silicon substrates by unfiltered and filtered direct carbon ion beams. In situ surface modification was performed using C- energies in the range of 300–500 eV prior to the growth of the film. By lowering the energy of the C− beam to 150 eV, an amorphous carbon film was continuously grown after the surface modification. High-resolution electron microscopy showed that the film/substrate interface was damaged by 400 and 500 eV C− beams. The carbon composition profile at the interface investigated by electron energy-loss spectroscopy illustrated that the 500 eV C− beam generated a 30 nm thick carbon/silicon mixing layer at the interface. The damage and mixing layers were not observed at 300 eV modification. Wear testing found that strong adhesion occurred in samples modified at 400 and 500 eV. However, at 300 eV, modified samples exhibited delamination failure, which indicated inferior adhesion of the films. Surface roughness evolution of 30, 60, and 90 nm thick films was investigated by atomic force microscopy. The film surface roughness decrease as a function of film thickness was much faster when the films were grown by the filtered C− beam.

Relationship Between Thermal Stability and Optical Bandgap of Fluorinated Amorphous Carbon Films

2001 ◽  
Vol 3 (5) ◽  
pp. 941-946 ◽  
Author(s):  
Yang Shen-dong ◽  
Ning Zhao-yuan ◽  
Huang Feng ◽  
Cheng Shan-hua ◽  
Ye Chao
Keyword(s):  
Thermal Stability ◽  
Amorphous Carbon ◽  
Carbon Films ◽  
Optical Bandgap ◽  
Amorphous Carbon Films
Sign in / Sign up

Export Citation Format

Share Document