Effect of deposition parameters on properties of TiO2 films deposited by reactive magnetron sputtering
2017 ◽
Vol 43
(14)
◽
pp. 10991-10998
◽
High Temperature Material Processes (An International Quarterly of High-Technology Plasma Processes)
◽
2015 ◽
Vol 19
(2)
◽
pp. 105-112
1995 ◽
Vol 6
(1)
◽
pp. 31-40
2005 ◽
Vol 475-479
◽
pp. 1223-1226
◽
Keyword(s):
2009 ◽
Vol 155
(1-2)
◽
pp. 83-87
◽
2007 ◽
Vol 25
(3)
◽
pp. 557-565
◽