scholarly journals High-performance La-doped BCZT thin film capacitors on LaNiO3/Pt composite bottom electrodes with ultra-high efficiency and high thermal stability

2019 ◽  
Vol 45 (9) ◽  
pp. 11749-11755 ◽  
Author(s):  
Shangkai He ◽  
Biaolin Peng ◽  
Glenn J.T. Leighton ◽  
Christopher Shaw ◽  
Ningzhang Wang ◽  
...  
Keyword(s):  
Thin Film ◽  
Thermal Stability ◽  
High Performance ◽  
High Efficiency ◽  
High Thermal Stability ◽  
Thin Film Capacitors ◽  
La Doped

Lead-free A2Bi4Ti5O18 thin film capacitors (A = Ba and Sr) with large energy storage density, high efficiency, and excellent thermal stability

2019 ◽  
Vol 7 (7) ◽  
pp. 1888-1895 ◽  
Author(s):  
Bingbing Yang ◽  
Mengyao Guo ◽  
Xianwu Tang ◽  
Renhuai Wei ◽  
Ling Hu ◽  
...  
Keyword(s):  
Thin Film ◽  
Thermal Stability ◽  
Energy Storage ◽  
High Efficiency ◽  
Lead Free ◽  
Energy Storage Density ◽  
Excellent Thermal Stability ◽  
Storage Density ◽  
Storage Performance ◽  
Thin Film Capacitors

The energy storage performance of Ba2Bi4Ti5O18 thin film (left) and the atomic schematic structure of A2Bi4Ti5O18 (right).

scholarly journals Investigation of reactively sputtered TaN thin-film resistors for microwave photonic applications

2021 ◽  
pp. 93-98
Author(s):  
Evgenii Erofeev ◽  
Egor Polyntsev ◽  
Sergei Ishutkin
Keyword(s):  
Thin Film ◽  
Thermal Stability ◽  
Magnetron Sputtering ◽  
Electrical Resistance ◽  
High Thermal Stability ◽  
Tantalum Nitride ◽  
Reactive Magnetron ◽  
Microwave Photonic ◽  
Thin Film Resistors ◽  
Thermal Stability Of

Electrophysical characteristics and their thermal stability of thin-film resistors based on tantalum nitride (TaN) obtained by reactive magnetron sputtering were investigated. The optimal modes of the magnetron sputtering process are determined, ensuring the Ta2N phase film composition with the value of the specific electrical resistance of 250 μm cm and high thermal stability of the parameters. On the basis of the investigations carried out, thin-film matching resistors were manufactured for use as part of an electro-optical InP-based MZ modulator

Design guideline of a thin film SOI power MOSFET for high thermal stability

2012 ◽  
Vol 52 (9-10) ◽  
pp. 2380-2384 ◽  
Author(s):  
Yuka Morisawa ◽  
Takuya Kodama ◽  
Satoshi Matsumoto
Keyword(s):  
Thin Film ◽  
Thermal Stability ◽  
High Thermal Stability ◽  
Design Guideline ◽  
Power Mosfet

A Study of Back Electrode Stacked With Low Cost Reflective Layers For High-Efficiency Thin-Film Silicon Solar Cell

2014 ◽  
Vol 136 (3) ◽  
Author(s):  
Tsung-Wei Chang ◽  
Chao-Te Liu ◽  
Wen-Hsi Lee ◽  
Yu-Jen Hsiao
Keyword(s):  
Thin Film ◽  
Solar Cell ◽  
High Performance ◽  
Silicon Solar Cell ◽  
High Efficiency ◽  
Low Cost ◽  
Visible Region ◽  
Particle Diameter ◽  
Solid Content ◽  
Thin Film Silicon

In this study, commercially available white paint is used as a pigmented dielectric reflector (PDR) in the fabrication of a low-cost back electrode stack with an Al-doped ZnO (AZO) layer for thin-film silicon solar cell applications. An initial AZO film was deposited by the radio-frequency magnetron sputtering method. In order to obtain the highest transmittance and lowest resistivity of AZO film, process parameters such as sputtering power and substrate temperature were investigated. The optimal 100-nm-thick AZO film with low resistivity and high transmittance in the visible region are 6.4 × 10−3 Ω·cm and above 80%, respectively. Using glue-like white paint doped withTiO2 nanoparticles as the PDR enhances the external quantum efficiency (EQE) of a microcrystalline silicon absorptive layer owing to the doped white particles improving Fabry–Pérot interference (FPI), which raises reflectance and scattering ability. To realize the cost down requirement, decreasing the noble metal film thickness such as a 30-nm-thick silver reflector film, and a small doping particle diameter (D50 = 135 nm) and a high solid content (20%) lead to FPI improvement and a great EQE, which is attributed to improved scattering and reflectivity because of optimum diameter (Dopt) and thicker PDR film. The results indicate that white paint can be used as a reflector coating in low-cost back-electrode structures in high-performance electronics.

TOUGHMET 2

Alloy Digest ◽  
2013 ◽  
Vol 62 (5) ◽  
Keyword(s):  
Heat Treatment ◽  
Thermal Stability ◽  
Fracture Toughness ◽  
Wear Resistance ◽  
High Performance ◽  
Mechanical Performance ◽  
High Thermal Stability ◽  
Lead Free ◽  
Plain Bearing ◽  
Ni Alloy

Abstract ToughMet 2 is a high performance, wrought, heat treatable, lead-free strip Cu-Ni alloy that imparts superior mechanical performance and high thermal stability to plain bearing applications. Parts are easily formed and they can be machined either before or after heat treatment. ToughMet alloys are a line of spinodal hardened Cu-Ni anti-galling alloys for bearings capable of performing with a variety of shafting materials and lubricants. The alloys combine a high lubricity with wear resistance in these severe loading conditions. This datasheet provides information on composition, physical properties, hardness, elasticity, and tensile properties as well as fracture toughness and fatigue. It also includes information on corrosion resistance as well as forming and machining. Filing Code: Cu-724. Producer or source: Materion Brush Performance Alloys. Originally published September 2004, revised May 2013.

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