Secondary electron emission characteristics of the Al2O3/MgO double-layer structure prepared by atomic layer deposition

Author(s):  
Weiwei Cao ◽  
Bo Wang ◽  
Yang Yang ◽  
Bingli Zhu ◽  
Junjiang Guo ◽  
...  

AIP Advances ◽  
2019 ◽  
Vol 9 (9) ◽  
pp. 095303 ◽  
Author(s):  
Junjiang Guo ◽  
Dan Wang ◽  
Yantao Xu ◽  
Xiangping Zhu ◽  
Kaile Wen ◽  
...  




2021 ◽  
Vol 11 (11) ◽  
pp. 4801
Author(s):  
Xiangping Zhu ◽  
Junjiang Guo ◽  
Xiangxin Li ◽  
Rundong Zhou ◽  
Dan Wang ◽  
...  

MgO is a kind of high secondary electron yield (SEY) material with important applications in electron multipliers. MgO coatings can be used as the electron emission layer for multiplier dynode to improve the electron gain significantly. However, the SEY investigation on ultrathin MgO coatings is not complete and needed to be supplemented urgently. In this work, a series of MgO coatings with increasing thickness were prepared by atomic layer deposition. SEY properties and energy spectra were characterized, and the effect of coating thickness on SEY was systematically analyzed. Experimental results show that SEY of MgO/Si samples rises as the coating thickness increases. Merely, SEY almost does not change with the coating thickness when the thickness exceeds 30 nm. Then, a SEY semi-empirical theory was employed to interpret the SEY regularities of MgO coatings by regarding the coating samples as ideal double-layer structures. Theoretical calculation quantitatively explained the SEY variation observed during the experiments, and further quantified the SEY contribution level of top coating and bottom substrate for the 1 nm and 20 nm MgO coatings. The work is of great significance for comprehending the SEY of ultrathin MgO coatings and expanding the applications of nanoscale coatings with high SEY.



2017 ◽  
Vol 9 (7) ◽  
pp. 168781401771180 ◽  
Author(s):  
Fa-Ta Tsai ◽  
Ching-Kong Chao ◽  
Kai-Jyun Jhong ◽  
Rwei-Ching Chang

Atomic layer deposition has become an important thin-film growth technique for producing gas diffusion barriers because of its low process temperature and its ability to produce uniform films. In this work, atomic layer deposition was used to deposit various Al2O3 and ZnO thin films on polyethylene terephthalate substrates; subsequently, the physical properties and water vapor transmission rates of the films were characterized. Single and hybrid films (Al2O3, ZnO, Al2O3/ZnO, and ZnO/Al2O3) with thicknesses of 25, 50, and 100 nm at a deposition temperature of 60°C were investigated. The deposited films were characterized for surface roughness, optical transmittance, adhesion, water vapor transmission rate, and contact angle. The results showed that the double-layer structure provided a higher water vapor transmission rate and higher adhesion strength than those of the single-layer structure although both the surface roughness and optical transmittance of the single-layer structure were slightly better than those of the double-layer structure. The results revealed that the atomic layer deposition-grown hybrids could act as water vapor barriers.



2021 ◽  
Vol 129 (9) ◽  
pp. 093304
Author(s):  
Dan Wang ◽  
Yongning He ◽  
Junjiang Guo ◽  
Yahui Cai ◽  
Zhangsong Mao ◽  
...  




Author(s):  
Taewon Jeong ◽  
Jeonghee Lee ◽  
SeGi Yu ◽  
Sunghwan Jin ◽  
Jungna Heo ◽  
...  


2020 ◽  
Vol 106 ◽  
pp. 107826 ◽  
Author(s):  
Kongting Wei ◽  
Ruozheng Wang ◽  
Jie Li ◽  
Biye Liu ◽  
Qiang Wei ◽  
...  


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