On the form of high-frequency voltage-capacitance characteristics of metal-insulator-semiconductor structures with a ferroelectric insulating layer BaxSr1-хTiO3
2011 ◽
Vol 53
(9)
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pp. 1921-1926
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1998 ◽
Vol 42
(12)
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pp. 2233-2238
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Keyword(s):
2008 ◽
Vol 53
(7)
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pp. 829-832
2004 ◽
Vol 22
(6)
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pp. 2379-2383
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