The effects of substrate temperature on refractive index dispersion and optical constants of CdZn(S0.8Se0.2)2 alloy thin films

2009 ◽  
Vol 480 (2) ◽  
pp. 234-237 ◽  
Author(s):  
Saliha Ilican ◽  
Yasemin Caglar ◽  
Mujdat Caglar ◽  
Fahrettin Yakuphanoglu
Keyword(s):  
Thin Films ◽  
Refractive Index ◽  
Substrate Temperature ◽  
Optical Constants ◽  
Refractive Index Dispersion

Substrate Temperature Effect on Optical Constants of Gd2O3 Thin Films

2010 ◽  
Vol 442 ◽  
pp. 96-101 ◽  
Author(s):  
M.F. Wasiq ◽  
M.Y. Nadeem ◽  
Franck Chollet ◽  
S. Atiq
Keyword(s):  
Thin Films ◽  
Refractive Index ◽  
Substrate Temperature ◽  
Band Gap ◽  
Extinction Coefficient ◽  
Optical Constants ◽  
Urbach Energy ◽  
Band Gap Energy ◽  
Oxide Material ◽  
Atomic Force

Effect of substrate temperature on lanthanide oxide material Gd2O3 thin films deposited by e-beam evaporation has been reported in the present work. Optical properties and surface morphology of as deposited films have been measured using spectrophotometry and atomic force microscopy respectively. Optical constants such as refractive index, extinction coefficient, band gap and Urbach energy have been determined by analysis of experimentally recorded absorption, transmittance and reflection data in wavelength range 200-800nm. Optical band gap energy shows decreasing while Urbach energy shows increasing behavior with increasing temperature. Extinction coefficient and refractive index with varying wavelengths are also calculated. Surface topographies of all samples are studied by atomic force microscope (AFM) and root mean square (RMS) value of roughness is observed increasing with increasing substrate temperature.

scholarly journals Optical constants of sputtered beryllium thin films determined from photoabsorption measurements in the spectral range 20.4–250 eV

2020 ◽  
Vol 27 (1) ◽  
pp. 75-82
Author(s):  
Mikhail Svechnikov ◽  
Nikolay Chkhalo ◽  
Alexey Lopatin ◽  
Roman Pleshkov ◽  
Vladimir Polkovnikov ◽  
...  
Keyword(s):  
Thin Films ◽  
Refractive Index ◽  
Synchrotron Radiation ◽  
Initial Data ◽  
Absorption Coefficient ◽  
Energy Range ◽  
Transmission Coefficient ◽  
Radiation Source ◽  
Optical Constants ◽  
Free Standing

In this work, the refractive index of beryllium in the photon energy range 20.4–250 eV was experimentally determined. The initial data include measurements of the transmittance of two free-standing Be films with thicknesses of 70 nm and 152 nm, as well as reflectometric measurements of similar films on a substrate. Measurements were carried out at the optics beamline of the BESSY II synchrotron radiation source. The absorption coefficient β was found directly from the transmission coefficient of the films, and the real part of the polarizability δ was calculated from the Kramers–Kronig relations. A comparison is carried out with results obtained 20 years ago at the ALS synchrotron using a similar methodology.

Optical Properties of NiO Thin Films: A Potential Material for Optoelectronic Devices

2012 ◽  
Vol 488-489 ◽  
pp. 103-108 ◽  
Author(s):  
Manisha Tyagi ◽  
Monika Tomar ◽  
Vinay Gupta
Keyword(s):  
Thin Films ◽  
Refractive Index ◽  
Optical Properties ◽  
Substrate Temperature ◽  
Band Gap ◽  
Urbach Energy ◽  
Rf Sputtering ◽  
Blue Shift ◽  
Structural Disorder ◽  
Near Ir

The influence of substrate temperature on the UV-Visible-near-IR optical properties, namely the band gap, the Urbach energy and the refractive index of NiO thin films deposited by RF sputtering has been investigated. The optical band gap of thin films showed the blue-shift in the transmission spectra with increase in the substrate temperature which is related to variation in carrier concentration of the deposited films. Urbach energy (EU) values indicate that the films deposited at 400 oC substrate temperature show least structural disorder. The refractive index of the films is found to decrease continuously with increase in the substrate temperature at all photon energies in the visible and near-IR region, and is attributed to the decreasing packing density of the films. Introduction

Determination of thin film refractive index and thickness by means of film phase thickness

Open Physics ◽  
2008 ◽  
Vol 6 (2) ◽  
Author(s):  
Milen Nenkov ◽  
Tamara Pencheva
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Refractive Index ◽  
Barium Titanate ◽  
Spectral Region ◽  
Complex Refractive Index ◽  
Refractive Index Dispersion ◽  
New Approach ◽  
Phase Thickness

AbstractA new approach for determination of refractive index dispersion n(λ) (the real part of the complex refractive index) and thickness d of thin films of negligible absorption and weak dispersion is proposed. The calculation procedure is based on determination of the phase thickness of the film in the spectral region of measured transmittance data. All points of measured spectra are included in the calculations. Barium titanate thin films are investigated in the spectral region 0.38–0.78 μm and their n(λ) and d are calculated. The approach is validated using Swanepoel’s method and it is found to be applicable for relatively thin films when measured transmittance spectra have one minimum and one maximum only.

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