Positron beam studies on the irradiation response of FeCrCoNi upon He ion implantation

2021 ◽  
pp. 162776
Author(s):  
S. Abhaya ◽  
R. Rajaraman ◽  
C. David
2000 ◽  
Vol 647 ◽  
Author(s):  
S.W.H. Eijt ◽  
C.V. Falub ◽  
A. van Veen ◽  
H. Schut ◽  
P.E. Mijnarends ◽  
...  

AbstractThe formation of nanovoids in Si(100) and MgO(100) by 3He ion implantation has been studied. Contrary to Si in which the voids are generally almost spherical, in MgO nearly perfectly rectangular nanosize voids are created. Recently, the 2D-ACAR setup at the Delft Positron Research Center has been coupled to the intense reactor-based variable-energy positron beam POSH. This allows a new method of monitoring thin layers containing nanovoids or defects by depth-selective high-resolution positron beam analysis. The 2D-ACAR spectra of Si with a buried layer of nanocavities reveal the presence of two additional components, the first related to para-positronium (p-Ps) formation in the nanovoids, and a second one most likely related to unsaturated Si-bonds at the internal surface of the voids. The positronium is present in excited kinetic states with an average energy of 0.3 eV. Refilling of the cavities by means of low dose 3He implantation (1×1014 cm−2) followed by annealing reduces the formation of Ps and the width of the Ps peak in the ACAR spectrum. This width reduction is due to collisions of Ps with He atoms in the voids. In MgO, p-Ps formed with an initial energy of ~3 eV shows a final average energy of 1.6 eV at annihilation due to collisions with the cavity walls. Possibilities of this new, non-destructive method of monitoring the sizes of cavities and the evolution of nanovoid layers will be discussed.


1992 ◽  
Vol 262 ◽  
Author(s):  
A. Uedono ◽  
Y. Ujihira ◽  
L. Wei ◽  
Y. Tabuki ◽  
S. Tanigawa ◽  
...  

ABSTRACTVacancy-type defects in ion implanted Si were studied by a monoenergetic positron beam. The depth-distributions of the defects were obtained from measurements of Doppler broadening profiles of the positron annihilation as a function of incident positron energy. The results showed that a size of vacany-clusters introduced by 150-keV P+-ion implantation was found to be smaller than that introduced by 2-MeV P+-ion implantation. This was attributed to an overlap of collision cascades in low-energy (150 keV) ion implanted specimens. From isochronal annealing experiments for 80-keV B+- and 150-keV P+-ion implanted specimens, the defected region was removed by 1200 °C annealing, however, for 2-MeV P+-implanted specimen, two-types of oxygen-vacancy complexes were found to coexist even after 1200 °C annealing.


2007 ◽  
Vol 56 (11) ◽  
pp. 6543
Author(s):  
Hao Xiao-Peng ◽  
Wang Bao-Yi ◽  
Yu Run-Sheng ◽  
Wei Long

2004 ◽  
Vol 445-446 ◽  
pp. 57-59 ◽  
Author(s):  
Z.Q. Chen ◽  
Masaki Maekawa ◽  
Takashi Sekiguchi ◽  
Ryoichi Suzuki ◽  
Atsuo Kawasuso

1992 ◽  
Vol 124 (1) ◽  
pp. 31-41 ◽  
Author(s):  
Akira Uedono ◽  
Long Wei ◽  
Shoichiro Tanigawa ◽  
Jun Sugiura ◽  
Makoto Ogasawara ◽  
...  

1997 ◽  
Vol 470 ◽  
Author(s):  
S. Tanigawa

ABATRACTVacancy-type defects in Si crystals introduced by ion implantation have been investigated by an energy-variable positron beam The present paper describes the general feature of point defects induced by ion implantation from the point of view of their dependence on implanted ion species, ion dose, ion energy, implanted targets, thermal after implantation, the presence of oxide overlayers and so on.


1992 ◽  
Vol 262 ◽  
Author(s):  
A. Uedono ◽  
Y. Ujihira ◽  
L. Wei ◽  
Y. Tabuki ◽  
S. Tanigawa ◽  
...  

ABSTRACTVacancy-type defects in 60-keV Be+-implanted GaAs and InP were studied by a monoenergetic positron beam. The depth distributions of vacancy-type defects were obtained from measurements of Doppler broadening profiles of the positron annihilation as a function of incident positron energy. Vacancy-type defects introduced by ion implantation were observed in n-type GaAs. For p-type GaAs, however, this was not the case. This can be attributed to the recombination of vacancy-type defects and pre-existed interstitial-type defects in p-type GaAs. The defects induced by ion implantation in InP were also studied.


2003 ◽  
Vol 16 (2) ◽  
pp. S293-S299 ◽  
Author(s):  
Z Q Chen ◽  
T Sekiguchi ◽  
X L Yuan ◽  
M Maekawa ◽  
A Kawasuso

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