Kinetics of halide chemical vapor deposition of silicon carbide film
2007 ◽
Vol 308
(1)
◽
pp. 189-197
◽
Keyword(s):
Growth rate and deposition process of silicon carbide film by low-pressure chemical vapor deposition
1996 ◽
Vol 169
(3)
◽
pp. 485-490
◽
2000 ◽
Vol 219
(3)
◽
pp. 245-252
◽
Keyword(s):
1999 ◽
Vol 38
(Part 1, No. 4A)
◽
pp. 2089-2091
◽
Keyword(s):
2017 ◽
Vol 2017.30
(0)
◽
pp. 116
Keyword(s):
1995 ◽
Vol 53
◽
pp. 256-257
Keyword(s):
Keyword(s):
1999 ◽
Vol 61-62
◽
pp. 172-175
◽
2007 ◽
Vol 46
(4A)
◽
pp. 1415-1426
◽
1994 ◽
Vol 241
(1-2)
◽
pp. 310-317
◽
Keyword(s):
2015 ◽
Vol 88
(6)
◽
pp. 1432-1441
◽