Influences of two-step growth and off-angle Ge substrate on crystalline quality of GaAs buffer layers grown by MOVPE

2015 ◽  
Vol 414 ◽  
pp. 15-20 ◽  
Author(s):  
Pornsiri Wanarattikan ◽  
Sakuntam Sanorpim ◽  
Somyod Denchitcharoen ◽  
Kenjiro Uesugi ◽  
Shigeyuki Kuboya ◽  
...  
2008 ◽  
Vol 1068 ◽  
Author(s):  
Ewa Dumiszewska ◽  
Wlodek Strupinski ◽  
Piotr Caban ◽  
Marek Wesolowski ◽  
Dariusz Lenkiewicz ◽  
...  

ABSTRACTThe influence of growth temperature on oxygen incorporation into GaN epitaxial layers was studied. GaN layers deposited at low temperatures were characterized by much higher oxygen concentration than those deposited at high temperature typically used for epitaxial growth. GaN buffer layers (HT GaN) about 1 μm thick were deposited on GaN nucleation layers (NL) with various thicknesses. The influence of NL thickness on crystalline quality and oxygen concentration of HT GaN layers were studied using RBS and SIMS. With increasing thickness of NL the crystalline quality of GaN buffer layers deteriorates and the oxygen concentration increases. It was observed that oxygen atoms incorporated at low temperature in NL diffuse into GaN buffer layer during high temperature growth as a consequence GaN NL is the source for unintentional oxygen doping.


2010 ◽  
Vol 506 (2) ◽  
pp. 530-532 ◽  
Author(s):  
Xia Liu ◽  
Hong Jiang ◽  
Guoqing Miao ◽  
Hang Song ◽  
Lianzhen Cao ◽  
...  

2001 ◽  
Vol 674 ◽  
Author(s):  
R. A. Lukaszew ◽  
V. Stoica ◽  
R. Clarke

ABSTRACTOne interesting application of epitaxial magnetic thin films is to use them as one of the electrodes in a spin-dependent tunneling junction, in order to use the magnetocrystalline anisotropy to define the required two states of the magnetization. [1] In our preliminary work, we prepared epitaxial magnetic films on copper buffer layers grown on silicon substrates. [2] The single crystalline quality of the films was particularly evident in the magnetization hysteresis loops, showing a sharp reversal at fairly high fields (120 Oe), when the samples were magnetized along the crystallographic easy axis. One technological disadvantage in this type of samples is the chemical interaction between the metallic layers and the silicon substrate.In order to explore the possibility of epitaxial magnetic films on less reactive substrates, we studied the growth on MgO substrates. We have shown that it is possible to obtain epitaxial (001) and (111) Ni films grown on MgO substrates. [3] In particular we observed that the crystalline quality of the films improved considerably after 10 nm of film growth. We will now present our studies on the magnetic properties of these films, particularly the azimuthal dependence of the magnetization reversal using MOKRE, correlating our finding with the structural characterization obtained with RHEED, STM and XRD.


2011 ◽  
Vol 509 (24) ◽  
pp. 6751-6755 ◽  
Author(s):  
Xia Liu ◽  
Hang Song ◽  
Guoqing Miao ◽  
Hong Jiang ◽  
Lianzhen Cao ◽  
...  

2004 ◽  
Vol 831 ◽  
Author(s):  
Daisuke Muto ◽  
Ryotaro Yoneda ◽  
Hiroyuki Naoi ◽  
Masahito Kurouchi ◽  
Tsutomu Araki ◽  
...  

ABSTRACTThe effects of the nitridation process of (0001) sapphire on crystalline quality of InN were clearly demonstrated. The InN films were grown on NFM (nitrogen flux modulation) HT-InN or LT-InN buffer layers, which had been deposited on nitridated sapphire substrates. We found that low-temperature nitridation of sapphire is effective in improving the tilt distribution of InN films. Whereas the twist distribution remained narrow and almost constant, independent of nitridation conditions, when LT-InN buffer layers were used. The XRC-FWHM value of 54 arcsec for (0002) InN, the lowest reported to date, was achieved by using the LT-InN buffer layer and sapphire nitridation at 300°C for 3 hours.


1996 ◽  
Vol 169 (4) ◽  
pp. 649-659 ◽  
Author(s):  
P. Kidd ◽  
D.J. Dunstan ◽  
H.G. Colson ◽  
M.A. Louren¸o ◽  
A. Sacedo´n ◽  
...  

Vacuum ◽  
2019 ◽  
Vol 164 ◽  
pp. 319-324 ◽  
Author(s):  
Kun Cao ◽  
Wanqi Jie ◽  
Gangqiang Zha ◽  
Ruiqi Hu ◽  
Sihong Wu ◽  
...  

2020 ◽  
Vol 31 (13) ◽  
pp. 9982-9988 ◽  
Author(s):  
Sujun Guan ◽  
Akihiro Mori ◽  
Mikihiro Kato ◽  
Xinwei Zhao

2003 ◽  
Vol 0 (7) ◽  
pp. 2141-2144
Author(s):  
H. Murakami ◽  
N. Kawaguchi ◽  
Y. Kangawa ◽  
Y. Kumagai ◽  
A. Koukitu

1997 ◽  
Vol 468 ◽  
Author(s):  
J. T. Kobayashi ◽  
N. P. Kobayashi ◽  
P. D. Dapkus ◽  
X. Zhang ◽  
D. H. Rich

ABSTRACTA multilayer buffer layer approach to GaN growth has been developed in which the thermal desorption and mass transport of low temperature buffer layer are minimized by deposition of successive layers at increased temperatures. High quality GaN with featureless surface morphology has been grown on (0001) sapphire substrate by metalorganic chemical vapor deposition using this multilayer buffer layer approach. The lateral growth and coalescence of truncated 3D islands (TTIs) nucleated on low temperature buffer layers at the initial stage of overlayer growth is affected by the thickness of the final buffer layer on which nucleation of TTIs takes place. The effect of the thickness of this buffer layer on the quality of GaN is studied by using scanning electron microscopy, van der Pauw geometry Hall measurements and cathodoluminescence and an optimum value of 400Å is obtained.


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