Effect of crystallization of Ni catalyst on direct precipitation of multilayer graphene using W capping layer

2021 ◽  
Vol 555 ◽  
pp. 125969
Author(s):  
Jumpei Yamada ◽  
Yuki Ueda ◽  
Takahiro Maruyama ◽  
Seiji Fujikawa ◽  
Takuo Sasaki ◽  
...  
2020 ◽  
Vol 534 ◽  
pp. 125493
Author(s):  
Jumpei Yamada ◽  
Yuki Ueda ◽  
Takahiro Maruyama ◽  
Shigeya Naritsuka

2015 ◽  
Vol 1786 ◽  
pp. 13-18 ◽  
Author(s):  
Jumpei Yamada ◽  
Manabu Suzuki ◽  
Yuki Ueda ◽  
Takahiro Maruyama ◽  
Shigeya Naritsuka

ABSTRACTThe mechanism for the precipitation of multilayer graphene was investigated with respect to the use of an Al2O3 barrier layer and Au capping layer. The Al2O3 barrier layer suppresses the dissolution of carbon into the catalyst, especially at low temperature, and assists a decrease in the density of graphene nuclei. On the other hand, the Au capping layer is beneficial to weaken the strong binding between the catalyst and the graphene carbon atoms, and enhances the surface migration of precipitated carbon adatoms. A combination of the Al2O3 barrier layer and Au capping layer is useful for the synthesis of high-quality graphene with large grains. On a sample with both layers annealed for 60 min, the area of 5-layer graphene islands is as large as 10 μm, and covers 60% of the entire surface. The Raman D/G band intensity ratio of 0.024 indicates the precipitated graphene is high quality.


2016 ◽  
Vol 55 (10) ◽  
pp. 100302 ◽  
Author(s):  
Jumpei Yamada ◽  
Yuki Ueda ◽  
Takahiro Maruyama ◽  
Shigeya Naritsuka

2003 ◽  
Vol 772 ◽  
Author(s):  
Masakazu Muroyama ◽  
Kazuto Kimura ◽  
Takao Yagi ◽  
Ichiro Saito

AbstractA carbon nanotube triode using Helicon Plasma-enhanced CVD with electroplated NiCo catalyst has been successfully fabricated. Isolated NiCo based metal catalyst was deposited at the bottom of the cathode wells by electroplating methods to control the density of carbon nanotubes and also reduce the activation energy of its growth. Helicon Plasma-enhanced CVD (HPECVD) has been used to deposit nanotubes at 400°C. Vertically aligned carbon nanotubes were then grown selectively on the electroplated Ni catalyst. Field emission measurements were performed with a triode structure. At a cathode to anode gap of 1.1mm, the turn on voltage for the gate was 170V.


Author(s):  
Byoung-Joon Kim ◽  
Hae-A-Seul Shin ◽  
In-Suk Choi ◽  
Young-Chang Joo

Abstract The electrical resistance Cu film on flexible substrate was investigated in cyclic bending deformation. The electrical resistance of 1 µm thick Cu film on flexible substrate increased up to 120 % after 500,000 cycles in 1.1 % tensile bending strain. Crack and extrusion were observed due to the fatigue damage of metal film. Low bending strain did not cause any damage on metal film but higher bending strain resulted in severe electrical and mechanical damage. Thinner film showed higher fatigue resistance because of the better mechanical property of thin film. Cu film with NiCr under-layer showed poorer fatigue resistance in tensile bending mode. Ni capping layer did not improve the fatigue resistance of Cu film, but Al capping layer suppressed crack formation and lowered electrical resistance change. The NiCr under layer, Ni capping layer, and Al capping layer effect on electrical resistance change of Cu film was compared with Cu only sample.


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