Homopolymer induced phase evolution in mesoporous silica from evaporation induced self-assembly process

In this research, several precursors were chosen to solve the drawbacks of using toxic and expensive chemicals in the synthesis of fibrous mesoporous silica particle via self-assembly process in microemulsion system. The synthesis of this emerging material normally is realized by using toxic cetylpyridinium bromide (CPB) as common structure directing agent in conjunction with combined cyclohexane and n-pentanol as expensive solvent and co-solvent, respectively. Less toxic cetyltrimethylammonium bromide (CTAB) can be the replacement for CPB but the use of this surfactant may drastically reduce the surface area of the resulting product. Herein, we report that the use of CTAB with combined toluene and n-butanol as affordable solvents can be used to synthesize fibrous mesoporous silica particle with high surface area. The material was well characterized by field emission scanning electron microscopy (FE-SEM), transmission electron microscopy (TEM), N2 adsorption/ desorption, X-ray difraction (XRD)and thermal gravimetry (TG). This material might be applied in potential applications such as catalysis, drug delivery and adsorption. Moreover, it can be used as a hard-template for fabricating another novel fibrous materials.

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Preparation of silver and nitrogen co-doped mesoporous zinc oxide nanoparticles by evaporation induced self assembly process to study their photocatalytic activity

Journal of Sol-Gel Science and Technology ◽

10.1007/s10971-019-04969-6 ◽

2019 ◽

Vol 90 (2) ◽

pp. 390-403 ◽

Cited By ~ 7

Author(s):

Nikhil Chauhan ◽

Virender Singh ◽

Suresh Kumar ◽

Monika Kumari ◽

Kapil Sirohi

Keyword(s):

Zinc Oxide ◽

Photocatalytic Activity ◽

Self Assembly ◽

Zinc Oxide Nanoparticles ◽

Oxide Nanoparticles ◽

Assembly Process ◽

Evaporation Induced Self Assembly ◽

Co Doped

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Study on Hexagonal Mesoporous Silica Film for Antireflective Coating

Key Engineering Materials ◽

10.4028/www.scientific.net/kem.509.74 ◽

2012 ◽

Vol 509 ◽

pp. 74-81

Author(s):

Qiang Pan ◽

Jun Shen ◽

Xiao Dong Wang ◽

Zhi Hua Zhang

Keyword(s):

Mesoporous Silica ◽

Self Assembly ◽

Mechanical Performance ◽

Silica Film ◽

Scratch Resistance ◽

Antireflective Coating ◽

Evaporation Induced Self Assembly ◽

Long Time ◽

Mesoporous Silica Film ◽

Commercial Applications

In this paper, ordered mesoporous silica film as a novel antireflective coating was directly synthesized via evaporation induced self-assembly (EISA) process with cetyltrimethylammonium bromide (CTAB) as template surfactant. The mesoporous silica film exhibits ordered 2D hexagonal microstructure as demonstrated by transmission electron microscopy (TEM) and small angle X-ray diffraction (SAXRD). The average transmittance of the coated glass is about 98%, which indicates an increasing transmitted light of 7.5% in the wavelength between 400nm and 800nm. The mechanical performance and hydrophobicity tests prove that the films have excellent scratch resistance and long-time stability. The results of the characterizations and tests show that the film prepared by this convenient method would be very useful and promising for lots of commercial applications.

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