Time-To-Latch-Up investigation of SCR devices as ESD protection structures on 65nm technology platform

2010 ◽  
Vol 50 (9-11) ◽  
pp. 1373-1378
Author(s):  
A. Tazzoli ◽  
M. Cordoni ◽  
P. Colombo ◽  
C. Bergonzoni ◽  
G. Meneghesso
2019 ◽  
Vol 14 (1) ◽  
Author(s):  
Zhuo Wang ◽  
Zhao Qi ◽  
Longfei Liang ◽  
Ming Qiao ◽  
Zhaoji Li ◽  
...  

2020 ◽  
Vol E103.C (4) ◽  
pp. 194-196
Author(s):  
Yibo JIANG ◽  
Hui BI ◽  
Wei ZHAO ◽  
Chen SHI ◽  
Xiaolei WANG

2013 ◽  
Vol 732-733 ◽  
pp. 1207-1211
Author(s):  
Shen Li Chen ◽  
Tzung Shian Wu

In this paper, we propose a novel high-voltage (HV) nLDMOS transistor with a small Ron resistance, low trigger voltage (Vt1) and high holding voltage (Vh) characteristics. Here, we introduce a deep N+-buried-layer (NBL) into this HV nLDMOS to evaluate the ESD/latch-up (LU) parameters variation. These electric snapback parameters affect the reliability of proposed device and its performance. Eventually, we expect this proposed HV stucture processed better characteristic behaviors, which can be applied to the power electronics and ESD protection application of HV ICs.


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