In this paper, we propose a novel high-voltage (HV) nLDMOS transistor with a small Ron resistance, low trigger voltage (Vt1) and high holding voltage (Vh) characteristics. Here, we introduce a deep N+-buried-layer (NBL) into this HV nLDMOS to evaluate the ESD/latch-up (LU) parameters variation. These electric snapback parameters affect the reliability of proposed device and its performance. Eventually, we expect this proposed HV stucture processed better characteristic behaviors, which can be applied to the power electronics and ESD protection application of HV ICs.