Opto-electronic properties of titanium-doped indium–tin-oxide films deposited by RF magnetron sputtering at room temperature

2006 ◽  
Vol 134 (1) ◽  
pp. 68-75 ◽  
Author(s):  
Chih-Hao Yang ◽  
Shih-Chin Lee ◽  
Tien-Chai Lin ◽  
Wen-Yan Zhuang
Keyword(s):  
Magnetron Sputtering ◽  
Electronic Properties ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Room Temperature ◽  
Oxide Films ◽  
Rf Magnetron Sputtering ◽  
Tin Oxide Films

Characteristics of Indium Tin Oxide Films Deposited by DC and RF Magnetron Sputtering

2001 ◽  
Vol 40 (Part 1, No. 5A) ◽  
pp. 3364-3369 ◽  
Author(s):  
Wenli Deng ◽  
Taizo Ohgi ◽  
Hitoshi Nejo ◽  
Daisuke Fujita
Keyword(s):  
Magnetron Sputtering ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Oxide Films ◽  
Rf Magnetron Sputtering ◽  
Tin Oxide Films

Opto-electronic properties of chromium doped indium–tin-oxide films deposited at room temperature

2008 ◽  
Vol 153 (1-3) ◽  
pp. 57-61 ◽  
Author(s):  
Wei-che Chang ◽  
Shih-chin Lee ◽  
Chih-hao Yang ◽  
Tien-chai Lin
Keyword(s):  
Electronic Properties ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Room Temperature ◽  
Oxide Films ◽  
Tin Oxide Films
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