Investigation of silicon-based light emitting diode sub-mounts: Enhanced performance and potential for improved reliability

2015 ◽  
Vol 31 ◽  
pp. 604-610 ◽  
Author(s):  
Shih-Chieh Tseng ◽  
Chao-Wei Tang ◽  
Hsueh-Chuan Liao ◽  
Kuan-Ming Li ◽  
Hong-Tsu Young
2004 ◽  
Vol 241 (14) ◽  
pp. 3387-3390 ◽  
Author(s):  
A. D. Prins ◽  
Y. Ishibashi ◽  
S. Sasahara ◽  
J. Nakahara ◽  
M. A. Lourenco ◽  
...  

ChemInform ◽  
2010 ◽  
Vol 32 (25) ◽  
pp. no-no
Author(s):  
Wai Lek Ng ◽  
M. A. Lourenco ◽  
R. M. Gwilliam ◽  
S. Ledain ◽  
G. Shao ◽  
...  

2011 ◽  
Vol 314-316 ◽  
pp. 359-363
Author(s):  
Cong Wang ◽  
Won Sang Lee ◽  
Nam Young Kim

A novel silicon-based packaging platform with the electroplated-based reflector and the electrode- guided interconnections is developed for the packaging component of a high-luminosity and high-efficiency multi-chip light-emitting diode (LED) module, which is patterned on a new type of insulating layer that consists of nanoporous anodized aluminum oxide (AAO) layer and plasma- enhanced chemical vapor deposition (PECVD) deposited silicon dioxide (SiO2) on a doped silicon substrate. The reflector and the electrical interconnections are successfully fabricated by using the electroplating method in the same body. In order to obtain the benefits of high efficiency LED modules, the requirements concerning thermal management and photomechanical layout have to be met. In this paper, we will discuss a novel fabrication method in LED module packaging platform, and then describe the thin layer of electroplated Cu/Ni/Au in order to reduce thermal resistance and to increase thermal diffusion efficiency. The heat generated by the LED chips is dissipated directly to the silicon body through the metal-plated platform, and truly excellent heat dissipation characteristics are observed. We demonstrate 987 lm 8 W-level cool-white light (5000 K, 16 V, 110 lm/W, CRI = 77) emission for 570 µm × 230 µm-chip LEDs at 600 mA operation.


MRS Bulletin ◽  
1993 ◽  
Vol 18 (7) ◽  
pp. 22-28 ◽  
Author(s):  
Leigh Canham

The semiconductor silicon is the dominant material in microelectronics and is one of the best-studied materials known to humanity. Its inability to emit light efficiently is therefore well documented. Nevertheless, a “holy grail” of semiconductor materials research has for decades been the realization of an efficient Si light-emitting diode (LED). Such a device would enable optoelectronic circuitry to be based entirely on silicon and would revolutionize VLSI technology since the other required Si-based devices (detectors, waveguides, modulators, etc.) have already been demonstrated. Although this holy grail has proved elusive, the 1990s have heralded greatly renewed interest and optimism in the development of such devices for both the visible and near-infrared spectral ranges. Dramatic progress is at last being made. This review focuses, in a somewhat chronological manner, on the progress of specific approaches to realizing crystalline structures of high radiative efficiency, and the materials constraints involved.


1992 ◽  
Vol 283 ◽  
Author(s):  
Nader M. Kalkhoran

ABSTRACTA patterning process compatible with conventional Si electronics technology, which has resolution better than 5 μm, has been developed in order to perform selected-area anodic etching for producing luminescent porous Si layers (PSL). Correlations between the anodic etching and photolithographic parameters have been identified, and their effects on the resolution and luminescence of porous Si layers have been studied. Finally, the first monolithic processing, i.e., true wafer-scale integration, of a Si-based visible light-emitting diode (LED) and a photodetector using conventional Si technology has been demonstrated.


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