Effects of annealing temperature towards properties of black silicon fabricated by aluminium-assisted chemical etching

2021 ◽  
Vol 133 ◽  
pp. 105932
Author(s):  
Shahnawaz Uddin ◽  
Md.Roslan Hashim ◽  
Mohd Zamir Pakhuruddin
2019 ◽  
Vol 91 ◽  
pp. 167-173 ◽  
Author(s):  
Nur Afidah Md. Noor ◽  
Siti Khadijah Mohamad ◽  
Siti Sarah Hamil ◽  
Mutharasu Devarajan ◽  
Mohd Zamir Pakhuruddin

2019 ◽  
Vol 806 ◽  
pp. 24-29 ◽  
Author(s):  
Olga V. Volovlikova ◽  
S.A. Gavrilov ◽  
P.I. Lazarenko ◽  
A.V. Kukin ◽  
A.A. Dudin ◽  
...  

This paper examines the influence of etching regimes on the reflectance of black silicon formed by Ni-assisted chemical etching. Black silicon exhibits properties of high light absorptance. The measured minimum values of the reflectance (R-min) of black silicon with thickness of 580 nm formed by metal-assisted chemical etching (MACE) for 60 minutes at 460 lx illumination were 2,3% in the UV region (200–400 nm), 0,5% in the visible region (400–750 nm) and 0,3% in the IR region (750–1300 nm). The findings showed that the reflectance of black silicon depends on its thickness, illumination and treatment duration. In addition, the porosity and refractive index were calculated.


2018 ◽  
Vol 5 (1) ◽  
pp. 015020 ◽  
Author(s):  
Kai Gao ◽  
Honglie Shen ◽  
Youwen Liu ◽  
Quntao Tang ◽  
Ye Jiang ◽  
...  

2018 ◽  
Vol 88 ◽  
pp. 250-255 ◽  
Author(s):  
Kai Gao ◽  
Honglie Shen ◽  
Youwen Liu ◽  
Ye Jiang ◽  
Chaofan Zheng ◽  
...  

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