Effects of oxygen ion beam application on crystalline structures of TiO2 films deposited on Si wafers by an ion beam assisted deposition

2006 ◽  
Vol 242 (1-2) ◽  
pp. 393-395 ◽  
Author(s):  
Katsuhiro Yokota ◽  
Yoshikazu Yano ◽  
Kazuhiro Nakamura ◽  
Masami Ohnishi ◽  
Fumiyoshi Miyashita
Keyword(s):  
Ion Beam ◽  
Tio2 Films ◽  
Crystalline Structures ◽  
Oxygen Ion ◽  
Ion Beam Assisted Deposition

Effect of Indium-Oxide Deposited Using an Oxygen Ion-Beam-Assisted-Deposition to Top-Emitting Organic Light-Emitting Diodes

2006 ◽  
Vol 45 (10B) ◽  
pp. 8457-8461 ◽  
Author(s):  
Chang Hyun Jeong ◽  
Jong Tae Lim ◽  
June Hee Lee ◽  
Mi Suk Kim ◽  
Jeong Woon Bae ◽  
...  
Keyword(s):  
Indium Oxide ◽  
Light Emitting Diodes ◽  
Ion Beam ◽  
Organic Light Emitting Diodes ◽  
Light Emitting ◽  
Oxygen Ion ◽  
Ion Beam Assisted Deposition ◽  
Organic Light

Preparation and characterization of indium tin oxide films formed by oxygen ion beam assisted deposition

2003 ◽  
Vol 126 (9) ◽  
pp. 509-513 ◽  
Author(s):  
C. Liu ◽  
T. Mihara ◽  
T. Matsutani ◽  
T. Asanuma ◽  
M. Kiuchi
Keyword(s):  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Ion Beam ◽  
Oxide Films ◽  
Oxygen Ion ◽  
Ion Beam Assisted Deposition ◽  
Tin Oxide Films

Characteristics of Y2O3 films on Si(111) grown by oxygen-ion beam-assisted deposition

2001 ◽  
Vol 382 (1-2) ◽  
pp. 288-296 ◽  
Author(s):  
M.-H. Cho ◽  
D.-H. Ko ◽  
J.G. Seo ◽  
S.W. Whangbo ◽  
K. Jeong ◽  
...  
Keyword(s):  
Ion Beam ◽  
Oxygen Ion ◽  
Ion Beam Assisted Deposition

Preparation and Characterization of Ion Beam Assisted Aluminum Oxide Films

1989 ◽  
Vol 157 ◽  
Author(s):  
James K. Hirvonen ◽  
T.G. Tetreault ◽  
G. Parker ◽  
P. Revesz ◽  
D. Land ◽  
...  
Keyword(s):  
Aluminum Oxide ◽  
Ion Beam ◽  
Optical Coatings ◽  
Refractive Indices ◽  
Ion Energy ◽  
Oxygen Ion ◽  
Ion Beam Assisted Deposition ◽  
Beam Analysis ◽  
Optical Ellipsometry

ABSTRACTThe ion beam assisted deposition (IBAD) technique has been employed to make aluminum oxide optical coatings. Deposition variables include aluminum oxide evaporant to oxygen ion beam flux ratios, substrate temperature, and ion energy. Characterization included optical ellipsometry, ion beam analysis, and adhesion tests. Films deposited with the aid of ions exhibited the highest refractive indices and best adhesion to their substrates.

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