Magnetic easy-axis switching in Co/Pt and Co/Au superlattices induced by nitrogen ion beam irradiation

Author(s):  
T. Blon ◽  
G. Ben Assayag ◽  
J.-C. Ousset ◽  
B. Pecassou ◽  
A. Claverie ◽  
...  
2004 ◽  
Vol 95 (12) ◽  
pp. 8030-8034 ◽  
Author(s):  
T. Blon ◽  
G. Ben Assayag ◽  
D. Chassaing ◽  
D. Hrabovsky ◽  
J. F. Bobo ◽  
...  

2018 ◽  
Vol 27 (3) ◽  
Author(s):  
Hamid Khazaei ◽  
Pirjo S.A. Mäkelä ◽  
Frederick L. Stoddard

Ion beam irradiation is a potential tool for inducing novel mutations in plants. We chose three crop species (rye, linseed, and faba bean) to determine the potential of nitrogen ion beam irradiation for inducing mutations. We tested ion beam irradiation with nitrogen ions at six different fluencies (5×105, 1×106, 5×106, 1×107, 5×107, and 1×108 N-ion cm-2) on dry grains. The three studied crop species had different sensitivities to the irradiation. Increased doses of ion irradiation had more effect on survival than on germination. Rye seedlings had the lowest survival rate at high doses of irradiation and significantly higher off-type plant phenotypes than the other two species. In M1 seedlings, stunted growth, failure to complete the plant life cycle and chlorophyll mutants were observed in all three species. Terminal-inflorescence mutations and sectional chimeras in faba bean were observed in the M2 generation. We conclude that ion beam irradiation is an effective tool for mutation breeding of diverse crop species when the appropriate dose is defined.


Vacuum ◽  
2004 ◽  
Vol 74 (3-4) ◽  
pp. 659-663 ◽  
Author(s):  
Isao Nakamura ◽  
Daisuke Matsui ◽  
Michiko Sasaki ◽  
Ichiro Takano ◽  
Yoshio Sawada

Author(s):  
Akane Kitamura (Ogawa) ◽  
Takahiro Satoh ◽  
Masashi Koka ◽  
Tomohiro Kobayashi ◽  
Tomihiro Kamiya

2013 ◽  
Vol 38 (1) ◽  
pp. 101-104 ◽  
Author(s):  
Akane Kitamura ◽  
Takahiro Satoh ◽  
Masashi Koka ◽  
Tomihiro Kamiya ◽  
Tomohiro Kobayashi

2007 ◽  
Vol 539-543 ◽  
pp. 3297-3302
Author(s):  
Yoshihisa Watanabe ◽  
Masami Aono ◽  
Nobuaki Kitazawa

Both bulk and thin film amorphous carbon were irradiated using a nitrogen ion beam and changes in surface roughness and composition after ion beam irradiation have been studied. Amorphous carbon thin films were prepared from toluene vapor using plasma enhanced chemical vapor deposition. Ion irradiation was performed at room temperature using a nitrogen ion beam and the ion beam energy was varied from 0.2 to 1.5 keV under the constant ion current density. Surface morphology was observed with atomic force microscopy (AFM). Depth profiles of nitrogen in the irradiated specimens were analyzed by X-ray photoelectron spectroscopy (XPS). AFM observations reveal that after the ion beam irradiation the surface of the bulk amorphous carbon becomes rough, while the surface of the amorphous carbon films becomes smooth. However, the notable difference in the surface roughness is hardly observed between low- and high-energy ion irradiation. From XPS studies, it is found that the nitrogen concentration near the surface increases after the ion irradiation for both bulk and thin films and irradiated nitrogen ions are combined with carbon, resulting in formation of carbon nitride layers. Depth profiles of nitrogen show that for the bulk specimen low-energy ion irradiation is more effective for the carbon nitride formation than high-energy ion irradiation, while for the thin films high-energy ions are implanted more deeply than low-energy ions.


2007 ◽  
Vol 15 (2) ◽  
pp. 113-125 ◽  
Author(s):  
B. Todorović‐Marković ◽  
I. Draganić ◽  
Z. Marković ◽  
Z. Stojanović ◽  
M. Mitrić ◽  
...  

Sign in / Sign up

Export Citation Format

Share Document