Incorporation of N in TiO2 films grown by DC-reactive magnetron sputtering
2012 ◽
Vol 273
◽
pp. 109-112
◽
2009 ◽
Vol 155
(1-2)
◽
pp. 83-87
◽
2009 ◽
Vol 203
(23)
◽
pp. 3661-3668
◽
2007 ◽
Vol 300
(2)
◽
pp. 551-554
◽
2014 ◽
Vol 240
◽
pp. 293-300
◽
Structure and Electrical Property of CuInS2 Thin Films Deposited by DC Reactive Magnetron Sputtering
2011 ◽
Vol 26
(12)
◽
pp. 1287-1292
◽
2011 ◽
Vol 21
(4)
◽
pp. 770-776
◽
2012 ◽
Vol 30
(3)
◽
pp. 031503
◽
2010 ◽
Vol 45
(18)
◽
pp. 4994-5001
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