Effect of the substrate temperature on the crystallization of TiO2 films prepared by DC reactive magnetron sputtering

2007 ◽  
Vol 300 (2) ◽  
pp. 551-554 ◽  
Author(s):  
Yuanyuan Zhang ◽  
Xiangyang Ma ◽  
Peiliang Chen ◽  
Deren Yang
Optik ◽  
2020 ◽  
Vol 206 ◽  
pp. 164297
Author(s):  
Paulina Sawicka-Chudy ◽  
Grzegorz Wisz ◽  
Maciej Sibiński ◽  
Zbigniew Starowicz ◽  
Łukasz Głowa ◽  
...  

Vacuum ◽  
2007 ◽  
Vol 82 (3) ◽  
pp. 328-335 ◽  
Author(s):  
Wenjie Zhang ◽  
Shenglong Zhu ◽  
Ying Li ◽  
Fuhui Wang

2009 ◽  
Vol 155 (1-2) ◽  
pp. 83-87 ◽  
Author(s):  
Wenjie Zhang ◽  
Kuanling Wang ◽  
Shenglong Zhu ◽  
Ying Li ◽  
Fuhui Wang ◽  
...  

2011 ◽  
Vol 239-242 ◽  
pp. 1626-1632 ◽  
Author(s):  
Chang Hu Yang ◽  
Zhong Quan Ma

Transparent and conductive c-axis oriented aluminum-doped zinc oxide (AZO) films have been prepared on glass substrate by dc reactive magnetron sputtering process. The structural, optical and electrical properties of the films were characterized by scanning electron microscope (SEM), X-ray diffraction (XRD), UV-Visible spectrophotometer and Hall effect measurement system. As the substrate temperature increased, the results showed that grain size of the AZO films gradually increased, the films had a strong c-axis oriented and the crystallization of films became better. The absorption edge first shows a red shift, and then switches to the blue shift with increasing substrate temperature. Optical band gap of AZO films first decreases and then increases with increasing substrate temperature. Resistivity of AZO films decreases with increasing substrate temperature but the rate of decline of resistivity becomes slow after substrate temperature reaches 250 °C. The carriers concentration of AZO films increases with substrate temperature increase.


1993 ◽  
Vol 297 ◽  
Author(s):  
Y. H. Liang ◽  
N. Maley ◽  
J. R. Abelson

We report the electronic properties, stability and microstructure of a-Si:H films grown at very high substrate temperature (Ts = 320∼425°C) by DC reactive magnetron sputtering (RMS). The partial pressures of Ar and H2 are fixed at 1.5 and 0.8 mT, respectively, during the deposition. The initial defect state density, determined by the constant photocurrent method (CPM), varies from 2∼5×l015 cm−3with H content changing from 15–10 at.% as Ts increases from 320–375°C. For 100 hrs white light exposure at lW/cm2, a heavily degraded state was obtained with mid–gap state density in the range 2-3×l016cm−3 over this Ts range. These are among the lowest values reported for intrinsic a–Si:H.


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