Proton-irradiation induced defects in modified 310S steels characterized with positron annihilation spectroscopy and transmission electron microscopy

Author(s):  
Weiping Zhang ◽  
Zhenyu Shen ◽  
Rui Tang ◽  
Suoxue Jin ◽  
Yaoxiang Song ◽  
...  
2011 ◽  
Vol 465 ◽  
pp. 199-202 ◽  
Author(s):  
Alena Michalcová ◽  
Dalibor Vojtěch ◽  
Pavel Novák ◽  
Ivan Procházka ◽  
Jakub Čížek ◽  
...  

An alloy containing Al – 3wt.% Cr – 3wt.% Fe – 0.8wt. % Ce, was prepared by melt spinning. Structure of obtained ribbons was observed by light, scanning and transmission electron microscopy. It was found out that the structure is very fine. Microhardness of cross sectioned ribbons was also measured. Defects in structure were determined by positron annihilation spectroscopy. The thermal stability of the alloy was observed by comparing rapidly solidified ribbons and ribbons annealed at 400°C and at 500°C for 100 h


2010 ◽  
Vol 24 (27) ◽  
pp. 2733-2739
Author(s):  
KAI ZHOU ◽  
HUI LI ◽  
ZHU WANG

Proton-irradiation induced defects in Te -doped GaSb have been studied by photoluminescence (PL) and positron annihilation spectroscopy (PAS). A 2.6 MeV proton irradiation with fluences of 1×1014 cm-2, and 3×1015 cm-2 was used to produce defects in the Te -doped GaSb samples with free electron concentration of 1×1017 cm-3 and 1×1018 cm-3 respectively. The change of S parameters in Te -doped samples irradiated with different proton fluences, indicates that the defects induced by proton irradiation are most likely the V Ga -related defects. The PL spectra of Te -doped GaSb with different proton irradiation doses were measured at 77 K. The results show that the V Ga -related defects induced by proton irradiation are acceptors in Te -doped GaSb . We have also found that the dopant-induced vacancies which are related to Te have existed in unirradiated samples.


2007 ◽  
Vol 994 ◽  
Author(s):  
Hannan Assaf ◽  
Esidor Ntsoenzok ◽  
Marie-France Barthe ◽  
Elisa Leoni ◽  
Marie-Odile Ruault ◽  
...  

AbstractThermally grown SiO2 was implanted at room temperature with 220 keV Kr in order to generate bubbles/cavities in the sample. The formation and thermal stability of these bubbles/cavities is studied in this work. Transmission Electron Microscopy (TEM), Rutherford Backscattering Spectrometry (RBS) and Positron Annihilation Spectroscopy (PAS) were used to provide a comprehensive characterisation of defects (bubbles, vacancy, Kr and other types of defects) created by Kr implantation in SiO2 layer. These measurements suggest that the bubbles observed with TEM were a consequence of the interaction between Kr and vacancies (V), with VnXem complexes created in the whole of implanted zone. After annealing, bubbles/cavities disappear from SiO2 due to the strongly desorption of Kr and the decrease in vacancy concentration.


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