Characteristic switching of a multilayer thin electrostatic actuator by a driving signal for an ultra-precision motion stage

2013 ◽  
Vol 37 (1) ◽  
pp. 107-116 ◽  
Author(s):  
Mariam Md Ghazaly ◽  
Kaiji Sato
Keyword(s):  
Electrostatic Actuator ◽  
Ultra Precision ◽  
Motion Stage ◽  
Precision Motion ◽  
Driving Signal

A novel way of squareness measurement on ultra-precision motion stage basing on the error separation

2016 ◽  
Author(s):  
Tao Lai ◽  
Xiaoqiang Peng ◽  
Guipeng Tie ◽  
Junfeng Liu ◽  
Meng Guo
Keyword(s):  
Error Separation ◽  
Ultra Precision ◽  
Motion Stage ◽  
Precision Motion

Identification of a precision motion stage based on the Hammerstein-Wiener model

2019 ◽  
Author(s):  
Zhu Zhang ◽  
Delong Zhang ◽  
Haiyang Zheng ◽  
Tao Huang ◽  
Yangqiu Xie
Keyword(s):  
Wiener Model ◽  
Motion Stage ◽  
Precision Motion

A Large Range Compliant Nano-Manipulator Supporting Electron Beam Lithography

2022 ◽  
pp. 1-48
Author(s):  
Yijie Liu ◽  
Zhen Zhang
Keyword(s):  
Electron Beam ◽  
Natural Frequency ◽  
High Precision ◽  
Electron Beam Lithography ◽  
Optimization Design ◽  
Large Range ◽  
Direct Write ◽  
Motion Stage ◽  
Cross Axis ◽  
Precision Motion

Abstract Electron beam lithography (EBL) is an important lithographic process of scanning a focused electron beam (e-beam) to direct write a custom pattern with nanometric accuracy. Due to the very limited field of the focused election beam, a motion stage is needed to move the sample to the e-beam field for processing large patterns. In order to eliminate the stitching error induced by the existing “step and scan” process, we in this paper propose a large range compliant nano-manipulator so that the manipulator and the election beam can be moved in a simultaneous manner. We also present an optimization design for the geometric parameters of the compliant manipulator under the vacuum environment. Experimental results demonstrate 1 mm × 1 mm travel range with high linearity, ~ 0.5% cross-axis error and 5 nm resolution. Moreover, the high natural frequency (~ 56 Hz) of the manipulator facilitates it to achieve high-precision motion of EBL.

Simultaneous optimization in ultra-precision motion systems

2019 ◽  
Vol 59 (6) ◽  
pp. 2273-2285
Author(s):  
Jing Wang ◽  
Ming Zhang ◽  
Yu Zhu ◽  
Kaiming Yang ◽  
Xin Li ◽  
...  
Keyword(s):  
Simultaneous Optimization ◽  
Ultra Precision ◽  
Precision Motion

Integrated Optimization of Structure and Control in Ultra-Precision Motion Systems

2019 ◽  
Author(s):  
Jing Wang ◽  
Ming Zhang ◽  
Yu Zhu ◽  
Xin Li ◽  
Leijie Wang
Keyword(s):  
Complex Dynamics ◽  
System Level ◽  
Structural Topology ◽  
Worst Case ◽  
Integrated Optimization ◽  
Motion System ◽  
Material Interpolation ◽  
Ultra Precision ◽  
Precision Motion ◽  
And Control

Abstract Ever-increasing demands for precision and efficiency in ultra-precision motion systems will result in a lightweight and flexible motion system with complex dynamics. In this paper, a systematic approach is proposed where control gains, 3D structural topology and actuator configuration are integrated into optimization to derive a system-level optimal design which possesses a high vibration control performance, and still satisfies multiple design constraints. A material interpolation model with high accuracy is proposed for the integrated optimization, a simple integral equation utilizing R-functions and level-set functions is established to represent complex non-overlapping constraints of actuators. Over-actuation degrees are utilized to actively control the dominant flexible modes. Responses of residual flexible modes are restricted by increasing the coincidence of their nodal areas at actuators (sensors) locations. The objective function is the constructed worst-case vibration energy of the flexible modes. A dual-loop solving strategy combining the genetic algorithm and the modified optimal criteria method is adopted to solve the optimization problem. A fine stage in the wafer stage is designed to prove the effectiveness of the proposed method.

Behavior Characteristics of Nano-Stage According to Hinge Structure

2007 ◽  
Vol 7 (11) ◽  
pp. 4146-4149 ◽  
Author(s):  
Hyun-Seong Oh ◽  
Sung-Jun Lee ◽  
Yong-Woo Kim ◽  
Deug-Woo Lee
Keyword(s):  
Optical Systems ◽  
Precision Machining ◽  
System Control ◽  
Nano Scale ◽  
Composite Joint ◽  
Ultra Precision ◽  
Probe Microscope ◽  
Motion Stage ◽  
Scale Motion ◽  
Behavior Characteristics

Nano-stages are used in many ultra-precision systems, such as scanning probe microscope (SPM), optical fiber aligners, ultra-precision cutting, measuring and optical systems. Generally, ultra-precision machining and measuring are achieved using a nano-scale motion stage actuated using Piezo-electric actuators (PZT), and the importance of and demands for the motion stage increase with the need to improve system performance and accuracy. However, it is difficult to find solutions because the performance and characteristics of nano-scale motion stages are determined by various factors, such as the hinge structure, actuator, and method of system control. This paper focuses on improving of leafspring and planar joint hinges, and suggests a composite joint hinge stage.

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