scholarly journals Disturbance of Thermodynamic Equilibrium of the Quartz-Water System and Silica Separation from the Liquid Phase at a Small Temperature Gradient

2013 ◽  
Vol 7 ◽  
pp. 6-9
Author(s):  
Victor A. Alekseyev ◽  
Ludmila S. Medvedeva
1995 ◽  
Vol 403 ◽  
Author(s):  
I. A. Rauf ◽  
M. Sayer

AbstractA simple process, involving a controlled temperature gradient on the surface of the substrate during the deposition of a thin film is described. This technique is similar to zone-refining but produces chains of impurity free grains. Simultaneously, dopants and other defects are confined to the grain boundaries separating two such chains. For a small temperature gradient only preferred orientation is obtained within a chain. For medium values of temperature gradient the grain boundaries within a chain are engineered to be either on a low energy coincidence site lattice (CSL) or a twin depending on the magnitude of gradient. For high magnitudes of temperature gradient, the chain is predicted to be a single crystal strip.


Author(s):  
Carlos Vinicius Xavier Bessa ◽  
João de Sá Brasil Lima ◽  
Bruno Chieregatti ◽  
Ricardo Galdino ◽  
Lucas Diego Rodrigues Ferreira

2015 ◽  
Vol 2 (1-2) ◽  
Author(s):  
Wilfried Wunderlich

AbstractThis paper reports about a new four-step analysis method for thermoelectric (TE) materials. While the Seebeck coefficient is usually measured under small temperature gradient, we report here the measurement of TE materials under large temperature gradient. The examined materials were Ag- and Bi-doped Mg


1984 ◽  
Vol 35 ◽  
Author(s):  
C.S. Wei ◽  
J. Van Der Spiegel ◽  
J. Santiago ◽  
L.E. Seiberling

ABSTRACTTransient processing of titanium silicides on single-crystal Si in a non-isothermal reactor provides high quality films. Heat from quartz-hal?gen tungsten lamps and a small temperature gradient act as driving forces for the reaction. The temperature gradient, small compared to the concentration gradient, shows negligible influence on the formation process. The influence of sample reflectivity on the other hand is appreciable. From Xe+ marker experiments, Si atoms are found to be the moving species either up or down the temperature gradient. Small amount of TiSi as an intermediate phase is found to be coexistent with TiSi2. The silicide formation of the implanted wafers is somewhat slower than that of the unimplanted wafers.


1988 ◽  
Vol 144 ◽  
Author(s):  
R. E. Kremer ◽  
D. Francomano ◽  
G. H. Beckhart ◽  
K. M. Burke ◽  
T. Miller

ABSTRACTWe have developed a process to grow both undoped, semi-insulating (SI) and silicon-doped, semiconducting (SC) GaAs using a vertical Bridgman method. The technique combines advantages of both liquid encapsulated Czochralski (LEC) and horizontal Bridgman (HB) processes. SI ingots, grown in pBN boats, and SC ingots, grown in quartz boats, are passed through a relatively shallow temperature gradient. Properties of the resulting material are highly uniform across the surface of a wafer. Because of the small temperature gradient, dislocation densities are very low (typically under 4000/cm∩2).


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