scholarly journals The management of technology enhanced study process development at LUA

2012 ◽  
Vol 41 ◽  
pp. 37-44
Author(s):  
Anna Vintere
2006 ◽  
Vol 113 ◽  
pp. 615-620
Author(s):  
Eligijus Toločka ◽  
Bronius Jančiauskas ◽  
Juozapas Audvydas Staškevičius

This article analyses a Mechatronic Systems` (MS) study process connected with the more correspondent preparation process of engineering professionals in the faculty of Mechanics at Vilnius Gediminas Technical University. The analysis and study highlighted aspects of the study process development and its implementation that would enable one at the same rate to prepare more qualified engineers. The authors suggest improving the MS study process for aspects of` practical implementation. Realization of this improvement also requires an appropriate development of the evaluation of the study process and its effectiveness. And this is also what the authors present in the article. Suggested improvement would not only help to develop contemporary MS studies but it could also be applied for the development of studies in other science areas.


2018 ◽  
Vol 7 (4.5) ◽  
pp. 110 ◽  
Author(s):  
Ronak Patel ◽  
Sanjay Patel

In current study, process has been developed for hydrogen production from bio-butanol via steam reforming (SR) for proton exchange membrane fuel cell (PEMFC) application. Heat integration with pinch analysis method was carried out to reduce overall heating and cooling utility requirement of energy intensive SR process. Despite of highly endothermic nature of bio-butanol SR, process found to be self-sustained in terms of requirement of heating utility. Heat integrated process for hydrogen production from bio-butanol SR was found to be green process, which can be explored for its hydrogen production capacity. 


2005 ◽  
Vol 11 (3) ◽  
pp. 212-219 ◽  
Author(s):  
Eligijus Toločka ◽  
Bronius Jančiauskas ◽  
Juozapas Audvydas Staškevičius ◽  
Rolandas Strazdas

This article analyses mechatronic systems bachelor's study process connected with more correspondent preparation process of engineering professionals in the faculty of Mechanics at Vilnius Gediminas Technical University. The analysis and study highlighted the aspects of study process development and its implementation that would enable at the same rate to prepare more qualified bachelors in engineering directions. The authors suggest the improved mechatronic systems bachelor's study process for the aspects of practical implementation. The realization of this improvement also requires the appropriate development of the evaluation of a study process and its effectiveness. And this is what the authors present in the article too. The suggested improvement would not only help to develop contemporary mechatronic systems’ studies but also could be applied for the development of studies in other areas.


Author(s):  
P. B. Basham ◽  
H. L. Tsai

The use of transmission electron microscopy (TEM) to support process development of advanced microelectronic devices is often challenged by a large amount of samples submitted from wafer fabrication areas and specific-spot analysis. Improving the TEM sample preparation techniques for a fast turnaround time is critical in order to provide a timely support for customers and improve the utilization of TEM. For the specific-area sample preparation, a technique which can be easily prepared with the least amount of effort is preferred. For these reasons, we have developed several techniques which have greatly facilitated the TEM sample preparation.For specific-area analysis, the use of a copper grid with a small hole is found to be very useful. With this small-hole grid technique, TEM sample preparation can be proceeded by well-established conventional methods. The sample is first polished to the area of interest, which is then carefully positioned inside the hole. This polished side is placed against the grid by epoxy Fig. 1 is an optical image of a TEM cross-section after dimpling to light transmission.


Author(s):  
C.K. Wu ◽  
P. Chang ◽  
N. Godinho

Recently, the use of refractory metal silicides as low resistivity, high temperature and high oxidation resistance gate materials in large scale integrated circuits (LSI) has become an important approach in advanced MOS process development (1). This research is a systematic study on the structure and properties of molybdenum silicide thin film and its applicability to high performance LSI fabrication.


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