Calibration of a fan-shaped beam surface plasmon resonance instrument for quantitative adsorbed thin film studies—No metal film thickness or optical properties required

2013 ◽  
Vol 176 ◽  
pp. 736-745 ◽  
Author(s):  
Antonella Badia ◽  
Ching-I Chen ◽  
Lana L. Norman
2011 ◽  
Vol 5 (2) ◽  
pp. 236-240 ◽  
Author(s):  
Yasuhiro Mizutani ◽  
◽  
Tetsuo Iwata

We have developed a method of measuring thin film thickness by using two optical properties that are highsensitivity for a film thickness, such as surface plasmon resonance (SPR) and elliptical properties with SPR response. The SPR signal is high sensitivity, suitable for measuring the thickness of a sample with a thin layer. This phenomenon can be detected by measuring the absorbance on the sample surface. We focused on the Otto configuration, a famous method for the generation of a SPR signal, which consists of 4 layers such as a SiO2 substrate, air, dielectric material and a metal layer. It is useful for the measurement of thin film thickness because there is an air layer in the configuration. However, the configuration has the disadvantage: it is necessary to adjust the distance from sample surface to the SiO2 substrate on a nanometer order. To overcome the problem, we focused on the modified Otto’s configuration proposed by Bliokh et. al [Appl. Phys. Lett. 89, 021908 (2006)]. In the configuration, there is a plano-convex lens of SiO2 as the substrate. By using its curvature, there is no adjustment process and the SPR signal can be detected easily. The SPR signal has a polarization property that depends on the thin film thickness. By analyzing of polarization properties of the SPR signal by means of ellipsometry, thin film thickness can be measured with sub-nanometer accuracy which is higher than the SPR signals. In this paper, further results involving the measurement are presented and discussed.


Photonics ◽  
2021 ◽  
Vol 8 (2) ◽  
pp. 41
Author(s):  
Najat Andam ◽  
Siham Refki ◽  
Hidekazu Ishitobi ◽  
Yasushi Inouye ◽  
Zouheir Sekkat

The determination of optical constants (i.e., real and imaginary parts of the complex refractive index (nc) and thickness (d)) of ultrathin films is often required in photonics. It may be done by using, for example, surface plasmon resonance (SPR) spectroscopy combined with either profilometry or atomic force microscopy (AFM). SPR yields the optical thickness (i.e., the product of nc and d) of the film, while profilometry and AFM yield its thickness, thereby allowing for the separate determination of nc and d. In this paper, we use SPR and profilometry to determine the complex refractive index of very thin (i.e., 58 nm) films of dye-doped polymers at different dye/polymer concentrations (a feature which constitutes the originality of this work), and we compare the SPR results with those obtained by using spectroscopic ellipsometry measurements performed on the same samples. To determine the optical properties of our film samples by ellipsometry, we used, for the theoretical fits to experimental data, Bruggeman’s effective medium model for the dye/polymer, assumed as a composite material, and the Lorentz model for dye absorption. We found an excellent agreement between the results obtained by SPR and ellipsometry, confirming that SPR is appropriate for measuring the optical properties of very thin coatings at a single light frequency, given that it is simpler in operation and data analysis than spectroscopic ellipsometry.


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