Fire-through contacts—a new approach to contact the rear side of passivated silicon solar cells

2013 ◽  
Vol 108 ◽  
pp. 164-169 ◽  
Author(s):  
Benjamin Thaidigsmann ◽  
Christopher Kick ◽  
Andreas Drews ◽  
Florian Clement ◽  
Andreas Wolf ◽  
...  
2013 ◽  
Vol 7 (8) ◽  
pp. 530-533 ◽  
Author(s):  
James Bullock ◽  
Andrew Thomson ◽  
Andrés Cuevas ◽  
Boris Veith ◽  
Jan Schmidt ◽  
...  

2017 ◽  
Vol 124 ◽  
pp. 680-690 ◽  
Author(s):  
Andreas Lorenz ◽  
Anna Münzer ◽  
Martin Lehner ◽  
Roland Greutmann ◽  
Heinz Brocker ◽  
...  

2016 ◽  
Vol 6 (5) ◽  
pp. 1080-1089 ◽  
Author(s):  
Zheng Xin ◽  
Shubham Duttagupta ◽  
Muzhi Tang ◽  
Zixuan Qiu ◽  
Baochen Liao ◽  
...  

2011 ◽  
Vol 1 (1) ◽  
pp. 16-21 ◽  
Author(s):  
Jiun-Hong Lai ◽  
Ajay Upadhyaya ◽  
Saptharishi Ramanathan ◽  
Arnab Das ◽  
Keith Tate ◽  
...  

2010 ◽  
Vol 1245 ◽  
Author(s):  
Corsin Battaglia ◽  
Jordi Escarre ◽  
Karin Söderström ◽  
Franz-Josef Haug ◽  
Didier Dominé ◽  
...  

AbstractWe investigate the influence of refractive index contrast on the light scattering properties of nanotextured interfaces, which serve as front contact for p-i-n thin-film silicon solar cells. We here focus on ZnO surfaces with randomly oriented pyramidal features, known for their excellent light trapping performance. Transparent replicas, with a different refractive index, but practically identical morphology compared to their ZnO masters, were fabricated via nanoimprinting. Within the theoretical framework we recently proposed, we show how the angular and spectral dependence of light scattered by nanostructures with identical morphology but different refractive index may be related to each other allowing direct comparison of their light trapping potential within the device.


2012 ◽  
Vol 27 ◽  
pp. 234-239 ◽  
Author(s):  
J. Greulich ◽  
N. Wöhrle ◽  
M. Glatthaar ◽  
S. Rein

2012 ◽  
Vol 195 ◽  
pp. 310-313 ◽  
Author(s):  
Abdelazize Laades ◽  
Heike Angermann ◽  
Hans Peter Sperlich ◽  
Uta Stürzebecher ◽  
Carlos Alberto Díaz Álvarez ◽  
...  

Aluminum oxide (AlOx) is currently under intensive investigation for use in surface passivation schemes in solar cells. AlOx films contain negative charges and therefore generate an accumulation layer on p-type silicon surfaces, which is very favorable for the rear side of p-type silicon solar cells as well as the p+-emitter at the front side of n-type silicon solar cells. However, it has been reported that quality of an interfacial silicon sub-oxide layer (SiOx), which is usually observed during deposition of AlOx on Silicon, strongly impacts the silicon/AlOx interface passivation properties [1]. The present work demonstrates that a convenient way to control the interface is to form thin wet chemical oxides of high quality prior to the deposition of AlOx/a-SiNx:H stacks by the plasma enhanced chemical vapor deposition (PECVD).


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