Chemical functionalization of carbon/polymer bipolar plate materials via oxygen plasma activation and subsequent silanization

2014 ◽  
Vol 240 ◽  
pp. 255-260 ◽  
Author(s):  
Martin Schade ◽  
Steffen Franzka ◽  
Anja Schröter ◽  
Franco Cappuccio ◽  
Martyna Gajda ◽  
...  
2021 ◽  
Vol 194 ◽  
pp. 113681
Author(s):  
Fangmeng Xu ◽  
Tao Xue ◽  
Xiaorui Liang ◽  
Qiulin Tan

2000 ◽  
Vol 657 ◽  
Author(s):  
Yonah Cho ◽  
Nathan W. Cheung

ABSTRACTChemical and physical effects of plasma exposed Si wafer pairs were investigated on Si wafer bonding. Oxygen plasma treated Si wafer pairs bonded more strongly at room temperature compared to chemically cleaned, hydrophilic and hydrophobic Si. After 50 hours of annealing at 105°C, the surface energy of the bonded Si pair reached the surface energy of bulk Si (100). X- ray photoemission spectroscopy (XPS) measurements indicated that the exposure of both hydrophilic and hydrophobic Si to oxygen plasma increased a SiO2 like state in the surface layer to a depth of 1.5 nm. Atomic force microscopy (AFM) study showed that plasma irradiation at 300 watts up to 30 seconds did not change surface roughness below 0.5 nm. Exposure to He plasma or N2 did result in enhanced bonding after annealing at 165°C, however, over smaller areas.


2010 ◽  
Vol 604 (17-18) ◽  
pp. 1502-1508 ◽  
Author(s):  
Michael A. Henderson

2020 ◽  
Vol 12 (38) ◽  
pp. 42634-42643 ◽  
Author(s):  
Yin-Chen Lin ◽  
Cheng-Hsun Chuang ◽  
Li-Yin Hsiao ◽  
Min-Hsin Yeh ◽  
Kuo-Chuan Ho

2010 ◽  
Vol 28 (3) ◽  
pp. 476-485 ◽  
Author(s):  
Sara B. Habib ◽  
Eleazar Gonzalez ◽  
Robert F. Hicks

Author(s):  
Virgil Peck ◽  
W. L. Carter

Any electron microscopical study of the morphology of bulk polymers has throughout the years been hampered by the lack of any real ability to produce meaningful surface variations for replication. True etching of polymers should show crystalline and amorphous regions in some form of relief. The use of solvents, acids, organic vapors, and inert ion bombardment to etch samples has proved to be useful only in limited applications. Certainly many interpretations of these results are subject to question.The recent use of a radiofrequency (R. F.) plasma of oxygen to degrade and remove organic material with only minor heating has opened a new possibility for etching polymers. However, rigid control of oxygen flow, time, current, and sample position are necessary in order to obtain reproducible results. The action is confined to surface layers; the molecular weight of the polymer residue after heavy etching is the same as the molecular weight of the polymer before attack, within the accuracy of measurement.


2020 ◽  
Vol 8 (44) ◽  
pp. 15852-15859
Author(s):  
Jiu Chen ◽  
Fuhua Li ◽  
Yurong Tang ◽  
Qing Tang

Chemical functionalization can significantly improve the stability of meta-stable 1T′-MoS2 and tune the surface HER activity.


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