Study of structural and optical properties of zirconium carbide (ZrC) thin-films deposited by ion beam sputtering for soft x-ray optical applications

2015 ◽  
Vol 272 ◽  
pp. 409-414 ◽  
Author(s):  
Amol Singh ◽  
Mohammed H. Modi ◽  
A.K. Sinha ◽  
Rajnish Dhawan ◽  
G.S. Lodha
Author(s):  
Tatiana V. Amotchkina ◽  
Detlev Ristau ◽  
Marc Lappschies ◽  
Marco Jupe ◽  
Alexander V. Tikhonravov ◽  
...  

2013 ◽  
Vol 734-737 ◽  
pp. 2545-2548
Author(s):  
Chao Ming Chen ◽  
Ping Fan ◽  
Guang Xing Liang ◽  
Zhuang Hao Zheng ◽  
Dong Ping Zhang ◽  
...  

This study reports the successful preparation of Cu (In, Ga)Se2(CIGS) thin film solar cells by ion beam sputtering with a chalcopyrite CIGS quaternary target. The films were fabricated with different beam currents. The thin films were characterized with X-ray diffraction (XRD), energy-dispersive X-ray spectroscopy (EDS), scanning electron microscopy (SEM) and hall effect-measurement system to study the microstructures, composition, surface morphology and electrical properties, respectively. Experimental results show that both the films are chalcopyrite structure, the Ga/(In+Ga) ratio, Cu/(In+Ga) ratio and Se/(Cu+In+Ga) ratio are decrease with the beam currents increase, the surfaces morphology of the films are dense, and the resistivity of the film deposited with the beam current of 40mA is 0.56Ωcm, with a carrier concentration of 4.11Χ1018cm-3and mobility of 2.73cm2V-1s-1. The resulting film exhibited p-type conductivity.


2007 ◽  
Vol 336-338 ◽  
pp. 1788-1790
Author(s):  
Yu Ju Chen ◽  
Wen Cheng J. Wei

Ion-beam sputtering deposition is a physical deposited method which uses accelerated ionbeam to sputter oxide or metal targets, and deposits atoms on substrate. Thin films of yttrium-stabilized zirconia (YSZ) were deposited on Si (100) wafer and NiO/YSZ plate. Scanning electron microscopy and transmission electron microscopy with EDS were employed to study the microstructural and chemically stoichiometric results of the films and the crystal growth process by various heat treatments. X-ray diffraction was also used to analysis crystalline phase of the YSZ films. The influence of different targets, substrates deposited efficiency and the properties of the film will be presented and discussed.


1996 ◽  
Vol 80 (Appendix) ◽  
pp. 273-273
Author(s):  
Ryuji Tsuchiya ◽  
Takahiro Hosoda ◽  
Yasuo Nakagawa ◽  
Fumio Ohtani ◽  
Tamaki Yaji

2010 ◽  
Vol 49 (9) ◽  
pp. 095802 ◽  
Author(s):  
Fatemeh Hajakbari ◽  
Majid Mojtahedzadeh Larijani ◽  
Mahmood Ghoranneviss ◽  
Morteza Aslaninejad ◽  
Alireza Hojabri

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