Low pressure deposition of LixZnyO thin films by means of RF plasma jet system

2004 ◽  
Vol 447-448 ◽  
pp. 656-662 ◽  
Author(s):  
Z Hubicka
Keyword(s):  
Thin Films ◽  
Plasma Jet ◽  
Low Pressure ◽  
Rf Plasma

Copper nitride thin films prepared by the RF plasma chemical reactor with low pressure supersonic single and multi-plasma jet system

1999 ◽  
Vol 116-119 ◽  
pp. 321-326 ◽  
Author(s):  
L Soukup ◽  
M Šı〔cha ◽  
F Fendrych ◽  
L Jastrabı〔k ◽  
Z Hubička ◽  
...  
Keyword(s):  
Thin Films ◽  
Plasma Jet ◽  
Chemical Reactor ◽  
Low Pressure ◽  
Rf Plasma ◽  
Plasma Chemical ◽  
Plasma Chemical Reactor ◽  
Copper Nitride

In situ XPS analysis of the electronic structure of silicon and titanium thin films exposed to low-pressure inductively-coupled RF plasma

2021 ◽  
Vol 542 ◽  
pp. 148684
Author(s):  
Jordi Fraxedas ◽  
Max Schütte ◽  
Guillaume Sauthier ◽  
Massimo Tallarida ◽  
Salvador Ferrer ◽  
...  
Keyword(s):  
Thin Films ◽  
Electronic Structure ◽  
Low Pressure ◽  
Rf Plasma ◽  
Xps Analysis ◽  
Inductively Coupled ◽  
In Situ Xps ◽  
Titanium Thin Films

Low-pressure RF multi-plasma-jet system for deposition of alloy and composite thin films

2001 ◽  
Vol 148 (2-3) ◽  
pp. 199-205 ◽  
Author(s):  
M Šı́cha ◽  
Z Hubicka ◽  
L Soukup ◽  
L Jastrabı́k ◽  
M Cada ◽  
...  
Keyword(s):  
Thin Films ◽  
Plasma Jet ◽  
Low Pressure ◽  
Composite Thin Films

Low Pressure RF Plasma Jet Sputtering Technique Applied to Ferroelectric Films: Ba1-x SrxTiO3

2006 ◽  
Vol 514-516 ◽  
pp. 165-169 ◽  
Author(s):  
Alexander Deyneka ◽  
Zdenek Hubička ◽  
V.A. Trepakov ◽  
Gunnar Suchaneck ◽  
Lubomir Jastrabik ◽  
...  
Keyword(s):  
Hysteresis Loops ◽  
Plasma Jet ◽  
Low Pressure ◽  
Rf Plasma ◽  
Ferroelectric Films ◽  
Si Substrates ◽  
Low Pressure Plasma ◽  
Bst Films ◽  
Bst Ceramics

Technology aspects and characterization of BaxSr1-xTiO3 (BST) films fabricated with low pressure plasma jet technique are presented. BST films were deposited on silicon coated with Pt/TiO2/SiO2 and on bare Si substrates. The nozzles-type RF hollow cathode has been fabricated from hot pressed BaTiO3, SrTiO3, and BST ceramics. Controlling of RF voltage, RF current and substrate temperature allowed us to deposit reproducible films with controlled grain size. Hysteresis loops, ellipsometric and micro-Raman investigation results are presented and discussed.

Investigation of the RF plasma jet system for deposition of LiCoOx thin films

2003 ◽  
Vol 174-175 ◽  
pp. 632-637 ◽  
Author(s):  
Z. Hubička ◽  
M. Čada ◽  
I. Jakubec ◽  
J. Bludská ◽  
Z. Málková ◽  
...  
Keyword(s):  
Thin Films ◽  
Plasma Jet ◽  
Rf Plasma

Deposition of PZT Thin Films on Polymer Substrate by Means of Low Pressure Plasma Jet System

2005 ◽  
Vol 316 (1) ◽  
pp. 157-166
Author(s):  
A. Deyneka ◽  
Z. Hubicka ◽  
L. Jastrabik ◽  
M. Cada ◽  
P. Virostko ◽  
...  
Keyword(s):  
Thin Films ◽  
Plasma Jet ◽  
Low Pressure ◽  
Polymer Substrate ◽  
Pzt Thin Films ◽  
Pressure Plasma ◽  
Low Pressure Plasma

Space Resolved Optical Emission Spectroscopy During Deposition of BaxSr1-xTiO3 Thin Films by Double Hollow Cathode Plasma Jet System

2009 ◽  
Vol 609 ◽  
pp. 105-109
Author(s):  
J. Olejníček ◽  
Zdenek Hubička ◽  
M. Čada ◽  
P. Virostko ◽  
Štepan Kment ◽  
...  
Keyword(s):  
Thin Films ◽  
Hollow Cathode ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Optical Emission ◽  
Plasma Jet ◽  
Optical Measurements ◽  
Rf Plasma ◽  
Oh Radicals ◽  
Cathode Plasma

Pulse modulated double hollow cathode RF plasma jet system with two separate independent nozzles made of BaTiO3 (BTO) and SrTiO3 (STO) was used for deposition of BSTO thin films on Si and on multi-layer Si/SiO2/TiO2/Pt substrates. Dielectric properties of BSTO layers strongly depend on ratio composition expressed by parameter x = Ba/(Ba+Sr) and on accuracy in presence of other elements. Space resolved optical emission spectroscopy (OES) was used mainly for monitoring of concentration of particles sputtered from the hollow cathode and for feedback correction of power supplied in both nozzles because applied power was responsible for sputtering speed of Ba and Sr particles. Main attention was focused on relation between ratio of spectral intensity of Ba, Ba+, Sr and Sr+ lines close to substrate and ratio of Ba and Sr concentration in the deposited film. 2D map of emission lines intensity distribution for Ba, Ba+, Sr, Sr+, Ti, Ar, and Ar+ for double hollow cathode plasma jet system with BTO and STO nozzles was created. OES was also used for observing of excess of Ti particles in final layer with negative effect on layer properties and for measurement of rotational temperature of OH radicals. Preliminary results of all these optical measurements are published in this paper. Deposited thin films were analyzed by X-ray diffraction, which confirmed presence of BSTO and STO perovskite phase in the films, by atomic force microscopy (AFM), by electron microprobe and by micro-Raman scattering measurement.

scholarly journals Carbon nitride thin films prepared by a capacitively coupled RF plasma jet

1996 ◽  
Vol 120 (1-4) ◽  
pp. 298-302 ◽  
Author(s):  
G. Dinescu ◽  
E. Aldea ◽  
P. Boieriu ◽  
G. Musa ◽  
A. Andrei ◽  
...  
Keyword(s):  
Thin Films ◽  
Carbon Nitride ◽  
Plasma Jet ◽  
Rf Plasma ◽  
Capacitively Coupled
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