Structural, optical and mechanical properties of aluminium nitride films prepared by reactive DC magnetron sputtering

2006 ◽  
Vol 502 (1-2) ◽  
pp. 235-239 ◽  
Author(s):  
S. Venkataraj ◽  
D. Severin ◽  
R. Drese ◽  
F. Koerfer ◽  
M. Wuttig
Keyword(s):  
Mechanical Properties ◽  
Magnetron Sputtering ◽  
Aluminium Nitride ◽  
Dc Magnetron Sputtering ◽  
Optical And Mechanical Properties

Optical and mechanical properties of AlF3 films produced by pulse magnetron sputtering of Al targets with CF4/O2 gas

2009 ◽  
Vol 16 (4) ◽  
pp. 505-510 ◽  
Author(s):  
Bo-Huei Liao ◽  
Cheng-Chung Lee ◽  
Cheng-Chung Jaing ◽  
Ming-Chung Liu
Keyword(s):  
Mechanical Properties ◽  
Magnetron Sputtering ◽  
Pulse Magnetron ◽  
Optical And Mechanical Properties

scholarly journals Nanoscale Mechanical Properties of Nanoindented Ni48.8Mn27.2Ga24 Ferromagnetic Shape Memory Thin Film

Scanning ◽  
2017 ◽  
Vol 2017 ◽  
pp. 1-5
Author(s):  
Xiaofei Fu ◽  
Chao Liu ◽  
Xili Lu ◽  
Xianli Li ◽  
Jingwei Lv ◽  
...  
Keyword(s):  
Thin Film ◽  
Mechanical Properties ◽  
Martensitic Transformation ◽  
Magnetron Sputtering ◽  
Shape Memory ◽  
Room Temperature ◽  
Shape Recovery ◽  
Recovery Ratio ◽  
Dc Magnetron Sputtering ◽  
Ferromagnetic Shape Memory

The structure and nanoscale mechanical properties of Ni48.8Mn27.2Ga24 thin film fabricated by DC magnetron sputtering are investigated systematically. The thin film has the austenite state at room temperature with the L21 Hesuler structure. During nanoindentation, stress-induced martensitic transformation occurs on the nanoscale for the film annealed at 823 K for 1 hour and the shape recovery ratio is up to 85.3%. The associated mechanism is discussed.

Effect of Sputtering Gas Pressure and Bias Voltage on Mechanical Properties of TiN Coating Deposited by DC Magnetron Sputtering

2004 ◽  
Author(s):  
Hirotaka Tanabe ◽  
Yoshio Miyoshi ◽  
Tohru Takamatsu ◽  
Hitoshi Awano ◽  
Takaaki Yamano
Keyword(s):  
Mechanical Properties ◽  
Residual Stress ◽  
Magnetron Sputtering ◽  
Bias Voltage ◽  
Adhesive Strength ◽  
Gas Pressure ◽  
Dc Magnetron Sputtering ◽  
Tin Films ◽  
Bombarding Energy ◽  
Gas Pressures

The mechanical properties of TiN films deposited on carbon steel JIS S45C by reactive dc magnetron sputtering under three sputtering gas pressures, 0.5Pa, 0.8Pa, and 1.76Pa were investigated. The residual stress once increased and then decreased with increasing bias voltage at 0.5Pa and 0.8Pa, but increased monotonously at 1.76Pa. These variations could be explained by the variations of the bombarding energy of a sputtered ion at each gas pressure. The variations of hardness and toughness correlated with the variation of residual stress. The variation of adhesive strength also could be explained by the variation of the bombarding energy with a model proposed in this study. A specific wear rate was also investigated, and it was found that to increase not only the hardness but also the adhesive strength is necessary to improve the wear resistance of TiN films.

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