Giant step bunching in epitaxial SrRuO3 films on vicinal SrTiO3(001)

2006 ◽  
Vol 495 (1-2) ◽  
pp. 159-164 ◽  
Author(s):  
F. Sánchez ◽  
G. Herranz ◽  
C. Ferrater ◽  
M.V. García-Cuenca ◽  
M. Varela ◽  
...  
Keyword(s):  
2021 ◽  
Vol 570 ◽  
pp. 151266
Author(s):  
Azza Hadj Youssef ◽  
Gitanjali Kolhatkar ◽  
Ifeanyichukwu C. Amaechi ◽  
Rajesh Katoch ◽  
Yoandris González ◽  
...  
Keyword(s):  

2010 ◽  
Vol 645-648 ◽  
pp. 543-546 ◽  
Author(s):  
Yuuki Ishida ◽  
Tetsuo Takahashi ◽  
Hajime Okumura ◽  
Kazuo Arai ◽  
Sadafumi Yoshida

In this study, we investigated the cluster effect on the occurrence of giant step bunching. We generated carbon clusters on 4H-SiC (0001) surfaces by thermal decomposition of SiC in an Ar atmosphere and controlled the surface concentrations of the clusters by adding H2 gas. We found the boundaries between surfaces with and without giant steps to show Arrhenius-type behavior. This behavior agreed with our predictions deduced from a chemical reaction model that takes the cluster effect into account, suggesting that giant step bunching is attributable to the formation of clusters on SiC.


2014 ◽  
Vol 778-780 ◽  
pp. 222-225 ◽  
Author(s):  
Yuuki Ishida ◽  
Sadafumi Yoshida

Trapezoid-shape (T-S) defects on epilayer surfaces, which include two kinds of the giant step bunching (GSB), are one of killer defects for MOSFETs. We have investigated the generation mechanism of the two GSBs using "step kinetics simulator" we developed. The simulator has reproduced the behavior of the GSBs. Based on results from the simulation, we have discussed the generation mechanism of the two GSBs.


2008 ◽  
Vol 600-603 ◽  
pp. 473-476 ◽  
Author(s):  
Yuuki Ishida ◽  
Tetsuo Takahashi ◽  
Hajime Okumura ◽  
Kazuo Arai ◽  
Sadafumi Yoshida

To elucidate the origin of giant step bunching on 4˚ off-axis 4H-SiC (0001) faces, we carried out hydrogen etching and epitaxial growth under various conditions. We found that giant step bunching occurs during hydrogen etching and epitaxial growth at extremely low or high C/Si ratios, i.e., with an excessive supply of SiH4 or C3H8. From these results, we have proposed that the origins of giant step bunching are asymmetry in the step kinetics in etching and Si or C cluster generation on terraces during growth.


1999 ◽  
Vol 38 (Part 2, No. 3B) ◽  
pp. L308-L311 ◽  
Author(s):  
Masashi Degawa ◽  
Hozumi Nishimura ◽  
Yasumasa Tanishiro ◽  
Hiroki Minoda ◽  
Katsumichi Yagi

2006 ◽  
Vol 73 (7) ◽  
Author(s):  
F. Sánchez ◽  
G. Herranz ◽  
J. Fontcuberta ◽  
M. V. García-Cuenca ◽  
C. Ferrater ◽  
...  

2014 ◽  
Vol 778-780 ◽  
pp. 183-186 ◽  
Author(s):  
Yuuki Ishida ◽  
Sadafumi Yoshida

We have developed the computer simulation including cluster effect and Schwoebel effect and investigated the conditions generating GSB using the simulation. We have demonstrated that the simulation developed can reproduce GSB. We have found for the occurence of GSB that there exists a threshold value of the surplus flux rate of Si-or C-source gases not contributing to growth, which depends on the flux rate of each source gas, namely the boundary between with and without GSB. It is noted that this boundary does not depend on the off-angle of substrates. We have also found the mechanism for explaining the occurrence of wavy surface morphplogy.


Author(s):  
A. Yamanaka ◽  
H. Ohse ◽  
K. Yagi

Recently current effects on clean and metal adsorbate surfaces have attracted much attention not only because of interesting phenomena but also because of practically importance in treatingclean and metal adsorbate surfaces [1-6]. In the former case, metals deposited migrate on the deposit depending on the current direction and a patch of the deposit expands on the clean surface [1]. The migration is closely related to the adsorbate structures and substrate structures including their anisotropy [2,7]. In the latter case, configurations of surface atomic steps depends on the current direction. In the case of Si(001) surface equally spaced array of monatom high steps along the [110] direction produces the 2x1 and 1x2 terraces. However, a relative terrace width of the two domain depends on the current direction; a step-up current widen terraces on which dimers are parallel to the current, while a step-down current widen the other terraces [3]. On (111) surface, a step-down current produces step bunching at temperatures between 1250-1350°C, while a step-up current produces step bunching at temperatures between 1050-1250°C [5].In the present paper, our REM observations on a current induced step bunching, started independently, are described.Our results are summarized as follows.(1) Above around 1000°C a step-up current induces step bunching. The phenomenon reverses around 1200 C; a step-down current induces step bunching. The observations agree with the previous reports [5].


Sign in / Sign up

Export Citation Format

Share Document