A comparative study on the structure and properties of nanolayered TiN/NbN and TiAlN/TiN multilayer coatings prepared by reactive direct current magnetron sputtering

Structure and properties of Ta/TaOx barrier films deposited by direct current magnetron sputtering

Vacuum ◽

10.1016/j.vacuum.2009.07.004 ◽

2009 ◽

Vol 84 (2) ◽

pp. 330-334 ◽

Cited By ~ 4

Author(s):

Y.M. Zhou ◽

Z. Xie ◽

H.N. Xiao ◽

P.F. Hu ◽

J. He

Keyword(s):

Magnetron Sputtering ◽

Direct Current ◽

Barrier Films ◽

Influence of Ni content on the structure and properties of Cr–Ni–N coatings prepared by direct current magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2009.01.014 ◽

2009 ◽

Vol 517 (11) ◽

pp. 3304-3309 ◽

Cited By ~ 22

Author(s):

Z.G. Zhang ◽

O. Rapaud ◽

N. Allain ◽

D. Mercs ◽

V. Brien ◽

...

Keyword(s):

Magnetron Sputtering ◽

Direct Current ◽

Ni Content ◽

Structure and properties of titanium nitride thin films deposited at low temperatures using direct current magnetron sputtering

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.579155 ◽

1994 ◽

Vol 12 (2) ◽

pp. 476-483 ◽

Cited By ~ 68

Author(s):

F. Elstner ◽

A. Ehrlich ◽

H. Giegengack ◽

H. Kupfer ◽

F. Richter

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Titanium Nitride ◽

Direct Current ◽

Low Temperatures ◽

Corrosion behavior of nanolayered TiN/NbN multilayer coatings prepared by reactive direct current magnetron sputtering process

Thin Solid Films ◽

10.1016/j.tsf.2004.01.096 ◽

2004 ◽

Vol 460 (1-2) ◽

pp. 133-142 ◽

Cited By ~ 64

Author(s):

Harish C Barshilia ◽

M Surya Prakash ◽

Aithu Poojari ◽

K.S Rajam

Keyword(s):

Magnetron Sputtering ◽

Corrosion Behavior ◽

Direct Current ◽

Multilayer Coatings ◽

A comparative study of direct current magnetron sputtering and high power impulse magnetron sputtering processes for CNx thin film growth with different inert gases

Diamond and Related Materials ◽

10.1016/j.diamond.2016.01.009 ◽

2016 ◽

Vol 64 ◽

pp. 13-26 ◽

Cited By ~ 14

Author(s):

Susann Schmidt ◽

Zsolt Czigány ◽

Jonas Wissting ◽

Grzegorz Greczynski ◽

Erik Janzén ◽

...

Keyword(s):

Thin Film ◽

Magnetron Sputtering ◽

Comparative Study ◽

Direct Current ◽

High Power ◽

Film Growth ◽

Thin Film Growth ◽

Inert Gases ◽

Comparative study of zinc oxide and aluminum doped zinc oxide transparent thin films grown by direct current magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2006.11.151 ◽

2007 ◽

Vol 515 (16) ◽

pp. 6562-6566 ◽

Cited By ~ 160

Author(s):

M. Suchea ◽

S. Christoulakis ◽

N. Katsarakis ◽

T. Kitsopoulos ◽

G. Kiriakidis

Keyword(s):

Thin Films ◽

Zinc Oxide ◽

Magnetron Sputtering ◽

Comparative Study ◽

Direct Current ◽

Direct Current Magnetron Sputtering ◽

Aluminum Doped Zinc Oxide

Electrochemical behavior of single layer CrN, TiN, TiAlN coatings and nanolayered TiAlN/CrN multilayer coatings prepared by reactive direct current magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2006.03.008 ◽

2006 ◽

Vol 514 (1-2) ◽

pp. 204-211 ◽

Cited By ~ 124

Author(s):

V.K. William Grips ◽

Harish C. Barshilia ◽

V. Ezhil Selvi ◽

Kalavati ◽

K.S. Rajam

Keyword(s):

Magnetron Sputtering ◽

Direct Current ◽

Electrochemical Behavior ◽

Single Layer ◽

Multilayer Coatings ◽

Effect of deposition atmosphere on the structure and properties of Mg doped CuCrO2 thin films prepared by direct current magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2015.10.061 ◽

2015 ◽

Vol 595 ◽

pp. 124-128 ◽

Cited By ~ 7

Author(s):

Suzhen Wu ◽

Zanhong Deng ◽

Weiwei Dong ◽

Jingzhen Shao ◽

Xiaodong Fang

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Direct Current ◽

Direct Current Magnetron Sputtering ◽

Mg Doped

Deposition and corrosion behavior of -oriented vanadium thick films by direct current magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2020.138491 ◽

2020 ◽

pp. 138491

Author(s):

Song Zhang ◽

Wenhua Xu ◽

Jun Li ◽

Rong Tu

Keyword(s):

Magnetron Sputtering ◽

Corrosion Behavior ◽

Direct Current ◽

Thick Films ◽

The growth of a multi-principal element (CoCrFeMnNi) oxynitride film by direct current magnetron sputtering using air as reactive gas

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2021.127433 ◽

2021 ◽

pp. 127433

Author(s):

G. Radnóczi ◽

R. Dedoncker ◽

G.Z. Radnóczi ◽

Zs. Czigány ◽

A. Sulyok ◽

...

Keyword(s):

Magnetron Sputtering ◽

Direct Current ◽

Principal Element ◽

Direct Current Magnetron Sputtering ◽

Oxynitride Film ◽

Reactive Gas