Fabrication and characterization of Ni–YSZ anode functional coatings by electron beam physical vapor deposition

2009 ◽  
Vol 517 (17) ◽  
pp. 4975-4978 ◽  
Author(s):  
B. Meng ◽  
Y. Sun ◽  
X.D. He ◽  
J.H. Peng
Keyword(s):  
Electron Beam ◽  
Vapor Deposition ◽  
Physical Vapor Deposition ◽  
Functional Coatings ◽  
Fabrication And Characterization

Fabrication and characterization of oxide ion conducting films, Zr1−xMxO2−δ(M = Y, Sc) on porous SOFC anodes, prepared by electron beam physical vapor deposition

2017 ◽  
Vol 1 (1) ◽  
pp. 103-111 ◽  
Author(s):  
Tae Ho Shin ◽  
Miyoung Shin ◽  
Geon-Woo Park ◽  
Shiwoo Lee ◽  
Sang-Kuk Woo ◽  
...  
Keyword(s):  
Electron Beam ◽  
Vapor Deposition ◽  
Physical Vapor Deposition ◽  
Fabrication And Characterization ◽  
Ion Conducting ◽  
Oxide Ion

Fabrication of improved and easily controlled thin electrolytes for SOFCsviaEB-PVD processing.

COMPOSITION AND NANOHARDNESS OF SiC FILMS DEPOSITED BY ELECTRON BEAM PHYSICAL VAPOR DEPOSITION

2009 ◽  
Vol 23 (06n07) ◽  
pp. 1910-1915 ◽  
Author(s):  
MIN TENG ◽  
XIAODONG HE ◽  
YUE SUN
Keyword(s):  
Electron Beam ◽  
Chemical Bonding ◽  
Vapor Deposition ◽  
Photoelectron Spectroscopy ◽  
Physical Vapor Deposition ◽  
Current Intensity ◽  
X Ray ◽  
Deposited Films ◽  
Sic Films

SiC films with a quantity of carbon and silicon were obtained by electron beam physical vapor deposition (EB-PVD) from a sintered SiC target with different current intensity of EB. The X-ray photoelectron spectroscopy (XPS) was used for characterization of chemical bonding states of C and Si elements in SiC films in order to study the influence of current intensity of EB on the compositions in the deposited films. At the same time, the nanohardness of the deposited films was investigated.

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