Effect of thermal annealing on the structural and mechanical properties of amorphous silicon carbide films prepared by polymer-source chemical vapor deposition

Thin Solid Films ◽

10.1016/j.tsf.2009.10.154 ◽

2010 ◽

Vol 518 (10) ◽

pp. 2738-2744 ◽

Author(s):

Y. Awad ◽

M.A. El Khakani ◽

D. Brassard ◽

R. Smirani ◽

N. Camiré ◽

...

Keyword(s):

Mechanical Properties ◽

Silicon Carbide ◽

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Thermal Annealing ◽

Vapor Deposition ◽

Chemical Vapor ◽

Amorphous Silicon Carbide

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Room temperature process for chemical vapor deposition of amorphous silicon carbide thin film using monomethylsilane gas

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2011.09.037 ◽

2011 ◽

Vol 206 (6) ◽

pp. 1503-1506 ◽

Author(s):

Hitoshi Habuka ◽

Yusuke Ando ◽

Masaki Tsuji

Keyword(s):

Thin Film ◽

Silicon Carbide ◽

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Room Temperature ◽

Chemical Vapor ◽

Amorphous Silicon Carbide

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Chemical vapor deposition of amorphous silicon carbide thin films on metal surfaces using monomethylsilane gas at low temperatures

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2012.11.078 ◽

2013 ◽

Vol 217 ◽

pp. 88-93 ◽

Author(s):

Hitoshi Habuka ◽

Masaki Tsuji

Keyword(s):

Silicon Carbide ◽

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Low Temperatures ◽

Metal Surfaces ◽

Chemical Vapor ◽

Amorphous Silicon Carbide

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Hydrogenated amorphous silicon carbide thin films deposited by plasma-enhanced chemical vapor deposition

Proceedings of the 2015 4th International Conference on Sustainable Energy and Environmental Engineering ◽

10.2991/icseee-15.2016.129 ◽

2016 ◽

Author(s):

Shiguo Yang ◽

Guozhi Wen ◽

Yang Luo ◽

Yi Liang

Keyword(s):

Silicon Carbide ◽

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Amorphous Silicon Carbide ◽

Hydrogenated Amorphous

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Properties of hydrogenated amorphous silicon carbide films prepared by plasma-enhanced chemical vapor deposition

Thin Solid Films ◽

10.1016/0040-6090(89)90573-7 ◽

1989 ◽

Vol 177 (1-2) ◽

pp. 253-262 ◽

Author(s):

Dan Kuhman ◽

Steve Grammatica ◽

Frank Jansen

Keyword(s):

Silicon Carbide ◽

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Amorphous Silicon Carbide ◽

Hydrogenated Amorphous

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Ion beam-induced chemical vapor deposition with hexamethyldisilane for hydrogenated amorphous silicon carbide and silicon carbonitride films

Surface and Coatings Technology ◽

10.1016/s0257-8972(03)00130-0 ◽

2003 ◽

Vol 169-170 ◽

pp. 624-627 ◽

Author(s):

Takaomi Matsutani ◽

Tatsuya Asanuma ◽

Chang Liu ◽

Masato Kiuchi ◽

Takae Takeuchi

Keyword(s):

Silicon Carbide ◽

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Ion Beam ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Silicon Carbonitride ◽

Amorphous Silicon Carbide ◽

Hydrogenated Amorphous

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Study of surface passivation of crystalline silicon with amorphous silicon carbide deposited by plasma enhanced chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.3665617 ◽

2011 ◽

Vol 99 (23) ◽

pp. 232106 ◽

Author(s):

D. Klein ◽

M. Kunst

Keyword(s):

Silicon Carbide ◽

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Surface Passivation ◽

Crystalline Silicon ◽

Chemical Vapor ◽

Amorphous Silicon Carbide

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Amorphous silicon carbide thin films (a-SiC:H) deposited by plasma-enhanced chemical vapor deposition as protective coatings for harsh environment applications

Thin Solid Films ◽

10.1016/j.tsf.2011.02.089 ◽

2011 ◽

Vol 519 (18) ◽

pp. 5892-5898 ◽

Author(s):

W. Daves ◽

A. Krauss ◽

N. Behnel ◽

V. Häublein ◽

A. Bauer ◽

...

Keyword(s):

Silicon Carbide ◽

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Protective Coatings ◽

Chemical Vapor ◽

Harsh Environment ◽

Amorphous Silicon Carbide

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Changes of chemical structure of hydrogenated amorphous silicon carbide films with the application of radio-frequency bias voltages during chemical vapor deposition

Diamond and Related Materials ◽

10.1016/j.diamond.2016.03.006 ◽

2016 ◽

Vol 66 ◽

pp. 1-9 ◽

Author(s):

Haruhiko Ito ◽

Takeshi Ogaki ◽

Motoki Kumakura ◽

Shunsuke Saeki ◽

Tsuneo Suzuki ◽

...

Keyword(s):

Silicon Carbide ◽

Chemical Vapor Deposition ◽

Radio Frequency ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Chemical Structure ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Amorphous Silicon Carbide ◽

Hydrogenated Amorphous

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Detecting free radicals during the hot wire chemical vapor deposition of amorphous silicon carbide films using single-source precursors

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.2194023 ◽

2006 ◽

Vol 24 (3) ◽

pp. 542-549 ◽

Author(s):

Gillian A. Zaharias ◽

H. L. Duan ◽

Stacey F. Bent

Keyword(s):

Silicon Carbide ◽

Free Radicals ◽

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Single Source ◽

Hot Wire ◽

Single Source Precursors ◽

Amorphous Silicon Carbide

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Amorphous silicon carbide films by plasma-enhanced chemical vapor deposition

[1993] Proceedings IEEE Micro Electro Mechanical Systems ◽

10.1109/memsys.1993.296915 ◽

2002 ◽

Author(s):

L. Tong ◽

M. Mehregany ◽

W.C. Tang

Keyword(s):

Silicon Carbide ◽

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Amorphous Silicon Carbide

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