Influence of carbon dioxide gas on internal stress and film density of tin oxide films grown by magnetron sputtering

2010 ◽  
Vol 518 (21) ◽  
pp. S14-S16 ◽  
Author(s):  
Toru Ashida ◽  
Kazuhiro Kato ◽  
Hideo Omoto ◽  
Atsushi Takamatsu
Keyword(s):  
Carbon Dioxide ◽  
Magnetron Sputtering ◽  
Internal Stress ◽  
Tin Oxide ◽  
Oxide Films ◽  
Film Density ◽  
Carbon Dioxide Gas ◽  
Tin Oxide Films

Indium tin oxide films with low resistivity and low internal stress

2003 ◽  
Vol 21 (4) ◽  
pp. 1351-1354 ◽  
Author(s):  
Shinji Takayama ◽  
Toshifumi Sugawara ◽  
Akira Tanaka ◽  
Tokuji Himuro
Keyword(s):  
Internal Stress ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Oxide Films ◽  
Low Resistivity ◽  
Tin Oxide Films

Characteristics of Indium Tin Oxide Films Deposited by DC and RF Magnetron Sputtering

2001 ◽  
Vol 40 (Part 1, No. 5A) ◽  
pp. 3364-3369 ◽  
Author(s):  
Wenli Deng ◽  
Taizo Ohgi ◽  
Hitoshi Nejo ◽  
Daisuke Fujita
Keyword(s):  
Magnetron Sputtering ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Oxide Films ◽  
Rf Magnetron Sputtering ◽  
Tin Oxide Films

Preparation and characterization of tantalum-doped indium tin oxide films deposited by magnetron sputtering

2008 ◽  
Vol 58 (3) ◽  
pp. 203-206 ◽  
Author(s):  
Bo Zhang ◽  
Xianping Dong ◽  
Xiaofeng Xu ◽  
Jiansheng Wu
Keyword(s):  
Magnetron Sputtering ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Oxide Films ◽  
Tin Oxide Films

Transparent semiconducting amorphous cadmium–gallium–tin oxide films by magnetron sputtering with water vapor

2017 ◽  
Vol 110 (25) ◽  
pp. 252107
Author(s):  
Hiroshi Yanagi ◽  
Yusuke Koyamaishi ◽  
Chiyuki Sato ◽  
Yota Kimura
Keyword(s):  
Water Vapor ◽  
Magnetron Sputtering ◽  
Tin Oxide ◽  
Oxide Films ◽  
Tin Oxide Films

Characteristics of indium tin oxide films deposited by r.f. magnetron sputtering

1995 ◽  
Vol 257 (1) ◽  
pp. 32-35 ◽  
Author(s):  
R.N. Joshi ◽  
V.P. Singh ◽  
J.C. McClure
Keyword(s):  
Magnetron Sputtering ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Oxide Films ◽  
Tin Oxide Films
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