Characterization of silicon oxide gas barrier films with controlling to the ion current density (ion flux) by plasma enhanced chemical vapor deposition

Su B. Jin; Youn J. Kim; Yoon S. Choi; In S. Choi; Jeon G. Han

doi:10.1016/j.tsf.2010.03.134

Characterization of silicon oxide gas barrier films with controlling to the ion current density (ion flux) by plasma enhanced chemical vapor deposition

Thin Solid Films ◽

10.1016/j.tsf.2010.03.134 ◽

2010 ◽

Vol 518 (22) ◽

pp. 6385-6389 ◽

Cited By ~ 18

Author(s):

Su B. Jin ◽

Youn J. Kim ◽

Yoon S. Choi ◽

In S. Choi ◽

Jeon G. Han

Keyword(s):

Chemical Vapor Deposition ◽

Current Density ◽

Vapor Deposition ◽

Silicon Oxide ◽

Chemical Vapor ◽

Ion Current ◽

Gas Barrier ◽

Barrier Films ◽

Ion Current Density

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Effect of rf bias (ion current density) on the hardness of amorphous silicon oxide films deposited by plasma enhanced chemical vapor deposition

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2010.06.061 ◽

2010 ◽

Vol 205 ◽

pp. S139-S143 ◽

Cited By ~ 11

Author(s):

Su B. Jin ◽

Yoon S. Choi ◽

Youn J. Kim ◽

In S. Choi ◽

Jeon G. Han

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Current Density ◽

Vapor Deposition ◽

Silicon Oxide ◽

Oxide Films ◽

Chemical Vapor ◽

Ion Current ◽

Amorphous Silicon Oxide ◽

Ion Current Density

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Characterization of methyl-doped silicon oxide film deposited using Flowfill™ chemical vapor deposition technology

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.1470510 ◽

2002 ◽

Vol 20 (3) ◽

pp. 828 ◽

Cited By ~ 12

Author(s):

Hongqiang Lu ◽

Hao Cui ◽

Ishwara Bhat ◽

Shyam Murarka ◽

Williams Lanford ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Oxide Film ◽

Vapor Deposition ◽

Silicon Oxide ◽

Chemical Vapor ◽

Silicon Oxide Film ◽

Doped Silicon ◽

Deposition Technology

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Plasma-assisted chemical vapor deposition and characterization of high quality silicon oxide films

Thin Solid Films ◽

10.1016/0040-6090(90)90211-u ◽

1990 ◽

Vol 193-194 ◽

pp. 595-609 ◽

Cited By ~ 25

Author(s):

S.V Nguyen ◽

D Dobuzinsky ◽

D Dopp ◽

R Gleason ◽

M Gibson ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Silicon Oxide ◽

Oxide Films ◽

Chemical Vapor ◽

High Quality

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Mechanical properties of carbon-modified silicon oxide barrier films deposited by plasma enhanced chemical vapor deposition on polymer substrates

Thin Solid Films ◽

10.1016/j.tsf.2006.12.176 ◽

2007 ◽

Vol 515 (13) ◽

pp. 5430-5438 ◽

Cited By ~ 14

Author(s):

A. Bieder ◽

V. Gondoin ◽

Y. Leterrier ◽

G. Tornare ◽

Ph. Rudolf von Rohr ◽

...

Keyword(s):

Mechanical Properties ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Silicon Oxide ◽

Chemical Vapor ◽

Polymer Substrates ◽

Barrier Films ◽

Oxide Barrier

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Organosilicon function of gas barrier films purely deposited by inductively coupled plasma chemical vapor deposition system

Journal of Alloys and Compounds ◽

10.1016/j.jallcom.2012.07.053 ◽

2012 ◽

Vol 542 ◽

pp. 11-16 ◽

Cited By ~ 10

Author(s):

Tung-Ying Lin ◽

Ching-Ting Lee

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Gas Barrier ◽

Plasma Chemical Vapor Deposition ◽

Barrier Films ◽

Inductively Coupled

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Characterization of Stable Fluorine-Doped Silicon Oxide Film Prepared by Biased Helicon Plasma Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.35.2526 ◽

1996 ◽

Vol 35 (Part 1, No. 4B) ◽

pp. 2526-2529 ◽

Cited By ~ 19

Author(s):

Takahiro Tamura ◽

Youichi Inoue ◽

Makoto Satoh ◽

Hikaru Yoshitaka ◽

Junro Sakai

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Silicon Oxide ◽

Chemical Vapor ◽

Plasma Chemical ◽

Helicon Plasma ◽

Silicon Oxide Film ◽

Plasma Chemical Vapor Deposition ◽

Doped Silicon

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Organosilicon/silicon oxide gas barrier structure encapsulated flexible plastic substrate by using plasma-enhanced chemical vapor deposition

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2012.05.080 ◽

2012 ◽

Vol 206 (22) ◽

pp. 4685-4691 ◽

Cited By ~ 30

Author(s):

Cheng-Yang Wu ◽

Ren-Mao Liao ◽

Li-Wei Lai ◽

Ming-Shin Jeng ◽

Day-Shan Liu

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Silicon Oxide ◽

Chemical Vapor ◽

Plastic Substrate ◽

Barrier Structure ◽

Gas Barrier ◽

Flexible Plastic Substrate

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Chemical vapor deposition growth and characterization of AlGaN nanowires

JOURNAL OF SHENZHEN UNIVERSITY SCIENCE AND ENGINEERING ◽

10.3724/sp.j.1249.2015.06638 ◽

2015 ◽

Vol 32 (6) ◽

pp. 638

Author(s):

Xingmin Cai ◽

Xiaoqiang Su ◽

Fan Ye ◽

Huan Wang ◽

Guangxing Liang ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Growth

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Epitaxial mist chemical vapor deposition growth and characterization of Cu3N films on (0001)α-Al2O3 substrates

Applied Physics Express ◽

10.35848/1882-0786/ab9a8f ◽

2020 ◽

Vol 13 (7) ◽

pp. 075505

Author(s):

Tomohiro Yamaguchi ◽

Hiroki Nagai ◽

Takanori Kiguchi ◽

Nao Wakabayashi ◽

Takuto Igawa ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Growth ◽

Α Al2o3

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Chemical Vapor Deposition Synthesis and Characterization of Hollow Carbon Nanospheres with High Specific Capacitance and Excellent Cycling Stability

Journal of Electronic Materials ◽

10.1007/s11664-021-08818-7 ◽

2021 ◽

Author(s):

Mehrdad Teymourzadeh ◽

Majid Seifi ◽

Mohammad Bagher Askari

Keyword(s):

Chemical Vapor Deposition ◽

Specific Capacitance ◽

Vapor Deposition ◽

Chemical Vapor ◽

High Specific Capacitance ◽

Synthesis And Characterization ◽

Carbon Nanospheres ◽

Excellent Cycling Stability ◽

Hollow Carbon

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