The effect of negative ions from the target on thin film deposition in a direct current magnetron sputtering system

2015 ◽  
Vol 587 ◽  
pp. 3-7 ◽  
Author(s):  
Min Young Hur ◽  
Jin Seok Kim ◽  
Hae June Lee
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Direct Current ◽  
Negative Ions ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Direct Current Magnetron Sputtering ◽  
Sputtering System

ZrCuAlNi thin film metallic glass grown by high power impulse and direct current magnetron sputtering

2021 ◽  
pp. 127029
Author(s):  
Niklas Bönninghoff ◽  
Wahyu Diyatmika ◽  
Jinn P. Chu ◽  
Stanislav Mráz ◽  
Jochen M. Schneider ◽  
...  
Keyword(s):  
Thin Film ◽  
Metallic Glass ◽  
Magnetron Sputtering ◽  
Direct Current ◽  
High Power ◽  
Direct Current Magnetron Sputtering

scholarly journals Sputtering System for Thin Film Deposition

Shinku ◽  
1971 ◽  
Vol 14 (6) ◽  
pp. 211-223
Author(s):  
Naokichi HOSOKAWA
Keyword(s):  
Thin Film ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Sputtering System

Optimal target sputtering mode for aluminum nitride thin film deposition by high power pulsed magnetron sputtering

Vacuum ◽  
2019 ◽  
Vol 160 ◽  
pp. 410-417 ◽  
Author(s):  
D.L. Ma ◽  
H.Y. Liu ◽  
Q.Y. Deng ◽  
W.M. Yang ◽  
K. Silins ◽  
...  
Keyword(s):  
Thin Film ◽  
Aluminum Nitride ◽  
Magnetron Sputtering ◽  
High Power ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Optimal Target ◽  
Pulsed Magnetron
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