Deposition and characterization of smooth ultra-nanocrystalline diamond film in CH4/H2/Ar by microwave plasma chemical vapor deposition

Vacuum ◽  
2010 ◽  
Vol 84 (11) ◽  
pp. 1347-1352 ◽  
Author(s):  
Y.S. Zou ◽  
Z.X. Li ◽  
Y.F. Wu
Keyword(s):  
Chemical Vapor Deposition ◽  
Diamond Film ◽  
Vapor Deposition ◽  
Microwave Plasma ◽  
Chemical Vapor ◽  
Nanocrystalline Diamond ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition

DEPOSITION AND CHARACTERIZATION OF NANOCRYSTALLINE DIAMOND FILMS ON MIRROR-POLISHED Si SUBSTRATE BY BIASED ENHANCED MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION

2002 ◽  
Vol 16 (06n07) ◽  
pp. 845-852
Author(s):  
T. Soga ◽  
T. Sharda ◽  
T. Jimbo ◽  
M. Umeno
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Methane Concentration ◽  
Microwave Plasma ◽  
Chemical Vapor ◽  
Nanocrystalline Diamond ◽  
Silicon Substrates ◽  
Si Substrate ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition

Hard and smooth nanocrystalline diamond (NCD) thin films were deposited on polished silicon substrates by biased enhanced growth in microwave plasma chemical vapor deposition. The films deposited with varying the methane concentration and biasing voltage were characterized by Raman spectroscopy, nano-indenter, x-ray diffraction and atomic force microscopy. Stress in the films increases with decreasing methane concentration in the gas-phase and with increasing biasing. The adhesion between NCD film and Si substrate is very strong sustaining the compressive stress as high as high as 85 GPa. It was hypothesized that hydrogen content of the films and graphitic content of the films are responsible in generating stress. The hardness is well correlated with the Raman peak intensity ratio of NCD peak to G peak.

Characterization of Surface Conductive Diamond Layer Grown by Microwave Plasma Chemical Vapor Deposition

1993 ◽  
Vol 32 (Part 2, No. 7B) ◽  
pp. L987-L989 ◽  
Author(s):  
Yusuke Mori ◽  
Yoshiyuki Show ◽  
Masahiro Deguchi ◽  
Hiromasa Yagi ◽  
Hiroyuki Yagyu ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Microwave Plasma ◽  
Chemical Vapor ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition ◽  
Diamond Layer
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