Reprint of: Effect of pulse parameter change on a-SiCN diaphragms for environmental cells fabricated by magnetic-field- and pulsed-plasma-enhanced chemical vapor deposition

Vacuum ◽

10.1016/j.vacuum.2019.03.043 ◽

2019 ◽

Vol 167 ◽

pp. 542-546 ◽

Cited By ~ 1

Author(s):

Masanori Murano ◽

Takaomi Matsutani ◽

Tadahiro Kawasaki

Keyword(s):

Magnetic Field ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Pulse Parameter ◽

Pulsed Plasma ◽

Parameter Change

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Effect of pulse parameter change on a-SiCN diaphragms for environmental cells fabricated by magnetic-field- and pulsed-plasma-enhanced chemical vapor deposition

Vacuum ◽

10.1016/j.vacuum.2018.09.005 ◽

2018 ◽

Vol 158 ◽

pp. 60-64 ◽

Cited By ~ 3

Author(s):

Masanori Murano ◽

Takaomi Matsutani ◽

Tadahiro Kawasaki

Keyword(s):

Magnetic Field ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Pulse Parameter ◽

Pulsed Plasma ◽

Parameter Change

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Formation of Iron Carbide Nanorod by Pulsed Plasma Chemical Vapor Deposition

Journal of Physics Conference Series ◽

10.1088/1742-6596/258/1/012012 ◽

2010 ◽

Vol 258 ◽

pp. 012012

Author(s):

S Yooyen ◽

T Kawamura ◽

S Kotake ◽

Y Suzuki

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Iron Carbide ◽

Chemical Vapor ◽

Pulsed Plasma ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Enhancement of metal oxide deposition rate and quality using pulsed plasma-enhanced chemical vapor deposition at low frequency

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.2966425 ◽

2008 ◽

Vol 26 (5) ◽

pp. 1213-1217 ◽

Cited By ~ 12

Author(s):

Michael T. Seman ◽

David N. Richards ◽

Pieter C. Rowlette ◽

Nicholas G. Kubala ◽

Colin A. Wolden

Keyword(s):

Chemical Vapor Deposition ◽

Metal Oxide ◽

Deposition Rate ◽

Vapor Deposition ◽

Low Frequency ◽

Chemical Vapor ◽

Pulsed Plasma ◽

Oxide Deposition

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A periodic magnetic field assisted chemical vapor deposition technique to fabricate diamond film with preferred orientation

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2016.03.026 ◽

2016 ◽

Vol 292 ◽

pp. 49-53 ◽

Cited By ~ 12

Author(s):

Yijia Wang ◽

Jiaxin Li ◽

Hangyu Long ◽

Hao Luo ◽

Bo Zhou ◽

...

Keyword(s):

Magnetic Field ◽

Chemical Vapor Deposition ◽

Diamond Film ◽

Vapor Deposition ◽

Chemical Vapor ◽

Preferred Orientation ◽

Deposition Technique ◽

Periodic Magnetic Field ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique

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Magnetic Field-Assisted Chemical Vapor Deposition of Iron Oxide Thin Films: Influence of Field–Matter Interactions on Phase Composition and Morphology

The Journal of Physical Chemistry Letters ◽

10.1021/acs.jpclett.9b02381 ◽

2019 ◽

Vol 10 (20) ◽

pp. 6253-6259 ◽

Cited By ~ 4

Author(s):

Daniel Stadler ◽

David N. Mueller ◽

Thomas Brede ◽

Tomáš Duchoň ◽

Thomas Fischer ◽

...

Keyword(s):

Magnetic Field ◽

Thin Films ◽

Phase Composition ◽

Chemical Vapor Deposition ◽

Iron Oxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Oxide Thin Films

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Structure of Microcrystalline Silicon Carbide Films Prepared by Hydrogen-Radical-Enhanced Chemical Vapor Deposition in Magnetic Field

Japanese Journal of Applied Physics ◽

10.1143/jjap.33.4395 ◽

1994 ◽

Vol 33 (Part 1, No. 7B) ◽

pp. 4395-4399 ◽

Cited By ~ 5

Author(s):

Kanji Yasui ◽

Masayoshi Muramoto ◽

Tadashi Akahane

Keyword(s):

Magnetic Field ◽

Silicon Carbide ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Microcrystalline Silicon ◽

Hydrogen Radical

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Characterization of diamond films deposited on Re substrate by magnetic field-assisted hot filament chemical vapor deposition

Applied Surface Science ◽

10.1016/j.apsusc.2011.03.131 ◽

2012 ◽

Vol 258 (6) ◽

pp. 2117-2120 ◽

Cited By ~ 3

Author(s):

Xiaobin Wu ◽

Zhiming Yu ◽

Xiaolong You ◽

Mengkun Tian ◽

Yilun Gong

Keyword(s):

Magnetic Field ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Diamond Films ◽

Chemical Vapor ◽

Hot Filament

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Pulsed plasma deposition from 1,1,2,2-tetrafluoroethane by electron cyclotron resonance and conventional plasma enhanced chemical vapor deposition

Journal of Applied Polymer Science ◽

10.1002/app.1308 ◽

2001 ◽

Vol 80 (11) ◽

pp. 2084-2092 ◽

Cited By ~ 18

Author(s):

Catherine B. Labelle ◽

Karen K. Gleason

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Deposition ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Pulsed Plasma ◽

Pulsed Plasma Deposition

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Spectroscopic ellipsometry characterization of nano-crystalline diamond films prepared at various substrate temperatures and pulsed plasma frequencies using microwave plasma enhanced chemical vapor deposition apparatus with linear antenna delivery

Thin Solid Films ◽

10.1016/j.tsf.2014.10.071 ◽

2014 ◽

Vol 571 ◽

pp. 230-237 ◽

Cited By ~ 5

Author(s):

J. Mistrik ◽

P. Janicek ◽

A. Taylor ◽

F. Fendrych ◽

L. Fekete ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Diamond Films ◽

Chemical Vapor ◽

Pulsed Plasma ◽

Linear Antenna ◽

Nano Crystalline ◽

Substrate Temperatures

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Kelvin force microscopy characterization of charging effect in thin a-SiOxNy:H layers deposited in pulsed plasma enhanced chemical vapor deposition process by tuning the Silicon-environment

Journal of Applied Physics ◽

10.1063/1.4805026 ◽

2013 ◽

Vol 113 (20) ◽

pp. 204102 ◽

Cited By ~ 16

Author(s):

C. Villeneuve-Faure ◽

K. Makasheva ◽

C. Bonafos ◽

B. Despax ◽

L. Boudou ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Chemical Vapor Deposition Process ◽

Pulsed Plasma ◽

Force Microscopy ◽

Microscopy Characterization ◽

Charging Effect

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