scholarly journals Kelvin force microscopy characterization of charging effect in thin a-SiOxNy:H layers deposited in pulsed plasma enhanced chemical vapor deposition process by tuning the Silicon-environment

2013 ◽  
Vol 113 (20) ◽  
pp. 204102 ◽  
Author(s):  
C. Villeneuve-Faure ◽  
K. Makasheva ◽  
C. Bonafos ◽  
B. Despax ◽  
L. Boudou ◽  
...  
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