Cost-effective, high-volume molecular beam epitaxy using a multi 6-in wafer reactor

2001 ◽  
Vol 227-228 ◽  
pp. 143-149
Author(s):  
Larry Leung ◽  
Damian Davison ◽  
Arthur Cornfeld ◽  
Frederick Towner ◽  
Dave Hartzell
JOM ◽  
1998 ◽  
Vol 50 (8) ◽  
pp. 37-39 ◽  
Author(s):  
David Hartzell ◽  
Larry K. Leung ◽  
Frederick J. Towner

2019 ◽  
Vol 514 ◽  
pp. 124-129
Author(s):  
Yukun Zhao ◽  
Wenxian Yang ◽  
Shulong Lu ◽  
Yuanyuan Wu ◽  
Xin Zhang ◽  
...  

2011 ◽  
Vol 326 ◽  
pp. 139-143 ◽  
Author(s):  
M. Ajmal Khan ◽  
T. Saito ◽  
M. Takeishi ◽  
T. Suemasu

The doping of Cu in the BaSi2 films grown by molecular beam epitaxy (MBE) with various Cu concentrations for the suitability of the solar cells was studied in this paper. The main objective of the present work is to investigate and compare the carrier concentration of Cu-doped BaSi2 films grown with different Cu Knudsen cell temperatures and qualify as a potential candidate for more efficient solar cells. The reflection high-energy electron diffraction (RHEED), X-ray diffraction (XRD) measurements and secondary ion mass spectroscopy (SIMS), were used to determine the structure, depth profile and composition of the grown samples. The electrical properties like resistivity as well as carrier concentration were measured by using a four point probe method and Van der Pauw technique, respectively. During the MBE growth, different temperatures for Cu Knudsen cell ranging from 800 to 1200 °C were chosen and the optimum growth condition for both heavily doped n-type as well as p-type in the MBE was investigated. In our previous work, the Al, Sb doped BaSi2 were used as a potential candidate for the formation of pn-junction for solar cells, but the result was not encouraging one due to diffusion and segregation problems in the surface and BaSi2/Si interface regions. In the present work n-type BaSi2 layers with their dopant atoms uniformly distributed in the grown layers for the formation of high-quality of BaSi2 pn-junction with single crystal nature were successfully developed. The realizations to develop cost effective and more efficient solar cells are inevitable for both terrestrial as well as space applications.


2020 ◽  
Vol 4 (4) ◽  
pp. 2035-2042 ◽  
Author(s):  
Byungjun Lee ◽  
Dejiu Fan ◽  
Stephen R. Forrest

A high volume linear molecular beam growth system is proposed. Costs of GaAs cells grown by this or other technologies remains ∼10× higher than silicon solar cells.


Author(s):  
Ghulam Moeen Uddin ◽  
Bing Sun ◽  
Katherine Ziemer ◽  
Abe Zeid ◽  
Sagar Kamarthi

Functional properties of thin film metal oxides depend upon their stoichiometric and structural uniformity. Controlling the film deposition process can help tune the functionality of these films by ensuring the control over chemistry and structure of the films. The high volume manufacturing of functional devices will benefit from the development of reliable control models developed from research efforts in designing robust manufacturing processes. The use of neural networks as computer models to simulate the molecular beam epitaxy (MBE) of iron oxide thin films is presented in this work. Monte Carlo experiments are used to study the sensitivities and significances of process control variables to the stoichiometric performance indicators. Moreover, we also explore the relationship between growth dynamics of iron oxide (Fe2O3, Fe3O4, and mixed FexOy) and magnesium oxide (MgO) thin films. The common metal adsorption controlled growth mechanism of two films with different structural and stoichiometric complexities were observed and the similarities among the trends of analogous stoichiometric indicators at comparable metal arrival rates of the two films are presented. The dependence of undesirable bonding states of iron and magnesium metals with the film thicknesses was also observed in both processes. The commonalities suggest the potential to use of neural network assisted Monte Carlo analysis to link common atomic-level mechanisms to processing variables in one nano-scale system and use them to predict some level of behavior in other nanoscale processes with similar atomic-level mechanisms.


Author(s):  
C.B. Carter ◽  
D.M. DeSimone ◽  
T. Griem ◽  
C.E.C. Wood

Molecular-beam epitaxy (MBE) is potentially an extremely valuable tool for growing III-V compounds. The value of the technique results partly from the ease with which controlled layers of precisely determined composition can be grown, and partly from the ability that it provides for growing accurately doped layers.


Author(s):  
D. Loretto ◽  
J. M. Gibson ◽  
S. M. Yalisove ◽  
R. T. Tung

The cobalt disilicide/silicon system has potential applications as a metal-base and as a permeable-base transistor. Although thin, low defect density, films of CoSi2 on Si(111) have been successfully grown, there are reasons to believe that Si(100)/CoSi2 may be better suited to the transmission of electrons at the silicon/silicide interface than Si(111)/CoSi2. A TEM study of the formation of CoSi2 on Si(100) is therefore being conducted. We have previously reported TEM observations on Si(111)/CoSi2 grown both in situ, in an ultra high vacuum (UHV) TEM and ex situ, in a conventional Molecular Beam Epitaxy system.The procedures used for the MBE growth have been described elsewhere. In situ experiments were performed in a JEOL 200CX electron microscope, extensively modified to give a vacuum of better than 10-9 T in the specimen region and the capacity to do in situ sample heating and deposition. Cobalt was deposited onto clean Si(100) samples by thermal evaporation from cobalt-coated Ta filaments.


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