Deposition and characterization of amorphous and micro-crystalline Si,C alloy thin films by a remote plasma-enhanced chemical-vapor deposition process - RPECVD

1991 ◽  
Vol 137-138 ◽  
pp. 741-744 ◽  
Author(s):  
C. Wang ◽  
G. Lucovsky ◽  
R.J. Nemanich
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