Deposition of SiO2 and TiO2 thin films by plasma enhanced chemical vapor deposition for antireflection coating

1997 ◽  
Vol 216 ◽  
pp. 77-82 ◽  
Author(s):  
C. Martinet ◽  
V. Paillard ◽  
A. Gagnaire ◽  
J. Joseph
2006 ◽  
Vol 500 (1-2) ◽  
pp. 19-26 ◽  
Author(s):  
F. Gracia ◽  
F. Yubero ◽  
J.P. Holgado ◽  
J.P. Espinos ◽  
A.R. Gonzalez-Elipe ◽  
...  

2014 ◽  
Vol 32 (6) ◽  
pp. 061502 ◽  
Author(s):  
Wenjiao B. Wang ◽  
Angel Yanguas-Gil ◽  
Yu Yang ◽  
Do-Young Kim ◽  
Gregory S. Girolami ◽  
...  

2021 ◽  
Vol 10 (4) ◽  
pp. 80-85
Author(s):  
Duc Ta Hong ◽  
Quang Phan Ngoc ◽  
Thang Vu Viet ◽  
Thang Le Minh

TiO2 thin films were synthesized by using Chemical Vapor Deposition (CVD) method on different substrates, such as glass, aluminium foil , and ceramic. The samples had been characterized by microscopy analysis, SEM, and EDS. The results show that TiO2 thin films were successfully fabricated and TiO2 nanocrystals with size of 50-100 nm loaded uniformly on surface of different substrates. The photocatalytic activities of all samples were investigated in photo-degradation of methyl orange (MO) under UV light irradiation and was followed by the UV-Vis diffuse reflectance spectroscopy, showing that the conversion of methyl orange achieved the highest percentage of 91% with TiO2 thin film synthesized on the ceramic substrate over 270 minutes of reaction. The hypothetical mechanism explaining this observation is that the surface morphology of ceramic plays a major role in the augmentation of MO molecules adsorption onto the surface of material, thus, improves the dye degradation process.


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