Surface morphology of C60 polycrystalline films from physical vapor deposition

2001 ◽  
Vol 396 (1-2) ◽  
pp. 103-108 ◽  
Author(s):  
Reui-San Chen ◽  
Yi-Jie Lin ◽  
Yu-Ching Su ◽  
Kuan-Cheng Chiu
2008 ◽  
Vol 15 (04) ◽  
pp. 401-410 ◽  
Author(s):  
A. MUBARAK ◽  
PARVEZ AKHTER ◽  
ESAH HAMZAH ◽  
MOHD RADZI HJ. MOHD TOFF ◽  
ISHTIAQ A. QAZI

Titanium nitride ( TiN ) widely used as hard coating material, was coated on tool steels, namely on high-speed steel (HSS) and D2 tool steel by physical vapor deposition method. The study concentrated on cathodic arc physical vapor deposition (CAPVD), a technique used for the deposition of hard coatings for tooling applications, and which has many advantages. The main drawback of this technique, however, is the formation of macrodroplets (MDs) during deposition, resulting in films with rougher morphology. Various standard characterization techniques and equipment, such as electron microscopy, atomic force microscopy, hardness testing machine, scratch tester, and pin-on-disc machine, were used to analyze and quantify the following properties and parameters: surface morphology, thickness, hardness, adhesion, and coefficient of friction (COF) of the deposited coatings. Surface morphology revealed that the MDs produced during the etching stage, protruded through the TiN film, resulting in film with deteriorated surface features. Both coating thickness and indentation loads influenced the hardness of the deposited coatings. The coatings deposited on HSS exhibit better adhesion compared to those on D2 tool steel. Standard deviation indicates that the coating deposited with thickness around 6.7 μm showed the most stable trend of COF versus sliding distance.


Author(s):  
X.-S. Wang ◽  
S.S. Kushvaha ◽  
X. Chu ◽  
H. Zhang ◽  
Z. Yan ◽  
...  

This article discusses the selective self-assembly of semi-metal straight and branched nanorods on inert substrates. In particular, it describes antimony (Sb) nanorods and bismuth (Bi) nanobelts on inert substrates by physical vapor deposition in vacuum without using any catalyst and nanoscale template. After describing the experimental and drift correction procedures, the article reviews previous studies of semi-metal growth on inert substrates. It then measures the surface morphology and atomic structures of self-assembled Sb nanorods and Bi nanobelts using an in-situ scanning tunnelling microscope (STM) in ultrahigh vacuum (UHV). Based on these STM data, a mechanism for the self-assembly of straight and branched semi-metal nanorods is proposed.


2007 ◽  
Vol 48 (4) ◽  
pp. 700-703 ◽  
Author(s):  
Dong-Wei Yan ◽  
Wei Liu ◽  
Hao-Ze Wang ◽  
Chun-Ru Wang

2003 ◽  
Vol 247 (3-4) ◽  
pp. 401-407 ◽  
Author(s):  
Wen-Rong Cheng ◽  
Shiow-Jing Tang ◽  
Yu-Ching Su ◽  
Yi-Jie Lin ◽  
Kuan-Cheng Chiu

Author(s):  
R.A. Redkin ◽  
◽  
D.A. Kobtsev ◽  
S.A. Bereznaya ◽  
Z.V. Korotchenko ◽  
...  

GaSe and InSe nanolayers were obtained by mechanical exfoliation and physical vapor deposition methods on silicon substrates. Employing atomic force microscopy the surface morphology and thickness of obtained InSe and GaSe nanolayers were studied, as well as their temporal stability. The observed spectral positions of the Raman peaks were in agreement with the position of the peaks known for bulk and nanolayered InSe and GaSe samples


Coatings ◽  
2019 ◽  
Vol 9 (3) ◽  
pp. 187 ◽  
Author(s):  
Laura Schwinger ◽  
Sebastian Lehmann ◽  
Lukas Zielbauer ◽  
Benedikt Scharfe ◽  
Thorsten Gerdes

The reflective properties of micro glass spheres (MGS) such as Solid Micro Glass Spheres (SMGS, “glass beads”) and Micro Hollow Glass Spheres (MHGS, “glass bubbles”) are utilized in various applications, for example, as retro-reflector for traffic road stripe paints or facade paints. The reflection behavior of the spheres can be further adapted by coating the surfaces of the spheres, e.g., by titanium dioxide or a metallic coating. Such coated spheres can be employed as, e.g., mid infrared (MIR)-reflective additives in wall paints to increase the thermal comfort in rooms. As a result, the demand of heating energy can be reduced. In this paper, the increase of the MIR-reflectance by applying an aluminum coating on MGS is discussed. Aluminum coatings are normally produced via the well-known Physical Vapor Deposition (PVD) or Chemical Vapor Deposition (CVD). In our work, the Liquid Phase Deposition (LPD) method, as a new, non-vacuum method for aluminum coating on spherical spheres, is investigated as an alternative, scalable, and simple coating process. The LPD-coating is characterized by X-ray diffraction (XRD), energy dispersive X-ray spectroscopy (EDX), scanning electron microscopy (SEM), and reflection measurements. The results are compared to a reference PVD-coating. It is shown that both sphere types, SMGS and MHGS, can be homogeneously coated with metallic aluminum using the LPD method but the surface morphology plays an important role concerning the reflection properties. With the SMGS, a smooth surface morphology and a reflectance increase to a value of 30% can be obtained. Due to a structured surface morphology, a reflection of only 5% could be achieved with the MHGS. However, post-treatments showed that a further increase is possible.


Author(s):  
V. C. Kannan ◽  
S. M. Merchant ◽  
R. B. Irwin ◽  
A. K. Nanda ◽  
M. Sundahl ◽  
...  

Metal silicides such as WSi2, MoSi2, TiSi2, TaSi2 and CoSi2 have received wide attention in recent years for semiconductor applications in integrated circuits. In this study, we describe the microstructures of WSix films deposited on SiO2 (oxide) and polysilicon (poly) surfaces on Si wafers afterdeposition and rapid thermal anneal (RTA) at several temperatures. The stoichiometry of WSix films was confirmed by Rutherford Backscattering Spectroscopy (RBS). A correlation between the observed microstructure and measured sheet resistance of the films was also obtained.WSix films were deposited by physical vapor deposition (PVD) using magnetron sputteringin a Varian 3180. A high purity tungsten silicide target with a Si:W ratio of 2.85 was used. Films deposited on oxide or poly substrates gave rise to a Si:W ratio of 2.65 as observed by RBS. To simulatethe thermal treatments of subsequent processing procedures, wafers with tungsten silicide films were subjected to RTA (AG Associates Heatpulse 4108) in a N2 ambient for 60 seconds at temperatures ranging from 700° to 1000°C.


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