A possible method for large area deposition of a-Si:H thin films using electron cyclotron resonance plasma-enhanced chemical vapor deposition

Thin Solid Films ◽

10.1016/s0040-6090(96)08949-3 ◽

1997 ◽

Vol 295 (1-2) ◽

pp. 67-72 ◽

Author(s):

Ju-Hyeon Lee ◽

Cheon-Man Shim ◽

Sang-Kook Park ◽

Dong-Geun Jung ◽

Sung Park

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Area Deposition ◽

Resonance Plasma

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Electron Cyclotron Resonance Plasma Sources and Their Use in Plasma-Assisted Chemical Vapor Deposition of Thin Films

Physics of Thin Films - Plasma Sources for Thin Film Deposition and Etching ◽

10.1016/b978-0-08-092513-4.50007-6 ◽

1994 ◽

pp. 121-233 ◽

Author(s):

OLEG A. POPOV

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Sources ◽

Resonance Plasma

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Preparation of ZnF2 and ZnF2–BaF2 thin films by electron cyclotron resonance plasma-enhanced chemical vapor deposition

Thin Solid Films ◽

10.1016/s0040-6090(99)00716-6 ◽

2000 ◽

Vol 358 (1-2) ◽

pp. 99-103 ◽

Author(s):

Masanori Shojiya ◽

Yoji Kawamoto ◽

Akio Konishi ◽

Hajimu Wakabayashi

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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I‐Vcharacteristics of electron‐cyclotron‐resonance plasma‐enhanced chemical‐vapor‐deposition silicon nitride thin films

Journal of Applied Physics ◽

10.1063/1.356455 ◽

1994 ◽

Vol 75 (2) ◽

pp. 979-984 ◽

Author(s):

Yoo‐Chan Jeon ◽

Ho‐Young Lee ◽

Seung‐Ki Joo

Keyword(s):

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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The origin of intrinsic stress and its relaxation for SiOF thin films deposited by electron cyclotron resonance plasma-enhanced chemical vapor deposition

Thin Solid Films ◽

10.1016/s0040-6090(00)01399-7 ◽

2000 ◽

Vol 379 (1-2) ◽

pp. 259-264 ◽

Author(s):

S.P. Kim ◽

S.K. Choi

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Intrinsic Stress ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Microcrystalline silicon thin films deposited by matrix-distributed electron cyclotron resonance plasma enhanced chemical vapor deposition using an SiF4 /H2chemistry

Journal of Physics D Applied Physics ◽

10.1088/0022-3727/49/28/285203 ◽

2016 ◽

Vol 49 (28) ◽

pp. 285203 ◽

Author(s):

Junkang Wang ◽

Pavel Bulkin ◽

Ileana Florea ◽

Jean-Luc Maurice ◽

Erik Johnson

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Microcrystalline Silicon ◽

Silicon Thin Films ◽

Resonance Plasma

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Effects of annealing in O2 and N2 on the electrical properties of tantalum oxide thin films prepared by electron cyclotron resonance plasma enhanced chemical vapor deposition

Journal of Electronic Materials ◽

10.1007/bf02655461 ◽

1995 ◽

Vol 24 (10) ◽

pp. 1435-1441 ◽

Author(s):

IL Kim ◽

Jong-Seok Kim ◽

Oh-Seung Kwon ◽

Sung-Tae Ahn ◽

John S. Chun ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Electrical Properties ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Tantalum Oxide ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Resonance Plasma

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Silicon nitride thin films deposited by electron cyclotron resonance plasma-enhanced chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.582106 ◽

1999 ◽

Vol 17 (2) ◽

pp. 433-444 ◽

Author(s):

M. Lapeyrade ◽

M. P. Besland ◽

C. Meva’a ◽

A. Sibaï ◽

G. Hollinger

Keyword(s):

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Optical and compositional characterization of SiO[sub x]N[sub y] and SiO[sub x] thin films deposited by electron cyclotron resonance plasma enhanced chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1651544 ◽

2004 ◽

Vol 22 (3) ◽

pp. 883 ◽

Author(s):

T. Roschuk ◽

J. Wojcik ◽

X. Tan ◽

J. A. Davies ◽

P. Mascher

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Compositional Characterization ◽

Resonance Plasma

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Silicon nitride thin films deposited by electron cyclotron resonance plasma enhanced chemical vapor deposition for micromechanical system applications

Thin Solid Films ◽

10.1016/j.tsf.2008.03.010 ◽

2008 ◽

Vol 516 (21) ◽

pp. 7777-7782 ◽

Author(s):

C. Biasotto ◽

J.A. Diniz ◽

A.M. Daltrini ◽

S.A. Moshkalev ◽

M.J.R. Monteiro

Keyword(s):

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Analysis of stress and composition of silicon nitride thin films deposited by electron cyclotron resonance plasma-enhanced chemical vapor deposition for microfabrication processes

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.1835316 ◽

2005 ◽

Vol 23 (1) ◽

pp. 168 ◽

Author(s):

E. Cianci ◽

F. Pirola ◽

V. Foglietti

Keyword(s):

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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