Effects of annealing in O2 and N2 on the electrical properties of tantalum oxide thin films prepared by electron cyclotron resonance plasma enhanced chemical vapor deposition

Electrical Properties ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Tantalum Oxide ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electrical properties of PZT thin films deposited by electron cyclotron resonance plasma enhanced chemical vapor deposition

Materials Chemistry and Physics ◽

10.1016/0254-0584(96)80094-0 ◽

1996 ◽

Vol 45 (2) ◽

pp. 155-158 ◽

Cited By ~ 6

Author(s):

S.T. Kim ◽

J.W. Kim ◽

S.W. Jung ◽

J.S. Shin ◽

S.T. Ahn ◽

...

Keyword(s):

Thin Films ◽

Electrical Properties ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Pzt Thin Films ◽

Electron Cyclotron Resonance Plasma Sources and Their Use in Plasma-Assisted Chemical Vapor Deposition of Thin Films

Physics of Thin Films - Plasma Sources for Thin Film Deposition and Etching ◽

10.1016/b978-0-08-092513-4.50007-6 ◽

1994 ◽

pp. 121-233 ◽

Cited By ~ 8

Author(s):

OLEG A. POPOV

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Plasma Sources ◽

Preparation of ZnF2 and ZnF2–BaF2 thin films by electron cyclotron resonance plasma-enhanced chemical vapor deposition

Thin Solid Films ◽

10.1016/s0040-6090(99)00716-6 ◽

2000 ◽

Vol 358 (1-2) ◽

pp. 99-103 ◽

Cited By ~ 3

Author(s):

Masanori Shojiya ◽

Yoji Kawamoto ◽

Akio Konishi ◽

Hajimu Wakabayashi

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Microstructure and Electrical Properties of Tantalum Oxide Thin Film Prepared by Electron Cyclotron Resonance Plasma-Enhanced Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.33.6691 ◽

1994 ◽

Vol 33 (Part 1, No. 12A) ◽

pp. 6691-6698 ◽

Cited By ~ 41

Author(s):

Il Kim ◽

Sung-Duck Ahn ◽

Bok-Won Cho ◽

Sung-Tae Ahn ◽

Jeong Yong Lee ◽

...

Keyword(s):

Thin Film ◽

Electrical Properties ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Tantalum Oxide ◽

Chemical Vapor ◽

Oxide Thin Film ◽

I‐Vcharacteristics of electron‐cyclotron‐resonance plasma‐enhanced chemical‐vapor‐deposition silicon nitride thin films

Journal of Applied Physics ◽

10.1063/1.356455 ◽

1994 ◽

Vol 75 (2) ◽

pp. 979-984 ◽

Cited By ~ 26

Author(s):

Yoo‐Chan Jeon ◽

Ho‐Young Lee ◽

Seung‐Ki Joo

Keyword(s):

Thin Films ◽

Silicon Nitride ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

The origin of intrinsic stress and its relaxation for SiOF thin films deposited by electron cyclotron resonance plasma-enhanced chemical vapor deposition

Thin Solid Films ◽

10.1016/s0040-6090(00)01399-7 ◽

2000 ◽

Vol 379 (1-2) ◽

pp. 259-264 ◽

Cited By ~ 12

Author(s):

S.P. Kim ◽

S.K. Choi

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Intrinsic Stress ◽

Microcrystalline silicon thin films deposited by matrix-distributed electron cyclotron resonance plasma enhanced chemical vapor deposition using an SiF4 /H2chemistry

Journal of Physics D Applied Physics ◽

10.1088/0022-3727/49/28/285203 ◽

2016 ◽

Vol 49 (28) ◽

pp. 285203 ◽

Cited By ~ 4

Author(s):

Junkang Wang ◽

Pavel Bulkin ◽

Ileana Florea ◽

Jean-Luc Maurice ◽

Erik Johnson

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Microcrystalline Silicon ◽

Silicon Thin Films ◽

A possible method for large area deposition of a-Si:H thin films using electron cyclotron resonance plasma-enhanced chemical vapor deposition

Thin Solid Films ◽

10.1016/s0040-6090(96)08949-3 ◽

1997 ◽

Vol 295 (1-2) ◽

pp. 67-72 ◽

Cited By ~ 1

Author(s):

Ju-Hyeon Lee ◽

Cheon-Man Shim ◽

Sang-Kook Park ◽

Dong-Geun Jung ◽

Sung Park

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Large Area ◽

Area Deposition ◽

Silicon nitride thin films deposited by electron cyclotron resonance plasma-enhanced chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.582106 ◽

1999 ◽

Vol 17 (2) ◽

pp. 433-444 ◽

Cited By ~ 17

Author(s):

M. Lapeyrade ◽

M. P. Besland ◽

C. Meva’a ◽

A. Sibaï ◽

G. Hollinger

Keyword(s):

Thin Films ◽

Silicon Nitride ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Optical and compositional characterization of SiO[sub x]N[sub y] and SiO[sub x] thin films deposited by electron cyclotron resonance plasma enhanced chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1651544 ◽

2004 ◽

Vol 22 (3) ◽

pp. 883 ◽

Cited By ~ 9

Author(s):

T. Roschuk ◽

J. Wojcik ◽

X. Tan ◽

J. A. Davies ◽

P. Mascher

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Compositional Characterization ◽