Optical and compositional characterization of SiO[sub x]N[sub y] and SiO[sub x] thin films deposited by electron cyclotron resonance plasma enhanced chemical vapor deposition

2004 ◽  
Vol 22 (3) ◽  
pp. 883 ◽  
Author(s):  
T. Roschuk ◽  
J. Wojcik ◽  
X. Tan ◽  
J. A. Davies ◽  
P. Mascher
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Chemical Vapor ◽  
Electron Cyclotron ◽  
Compositional Characterization ◽  
Resonance Plasma
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