Microcrystalline silicon thin films deposited by matrix-distributed electron cyclotron resonance plasma enhanced chemical vapor deposition using an SiF4 /H2chemistry
2016 ◽
Vol 49
(28)
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pp. 285203
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1999 ◽
Vol 17
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pp. 1987-1990
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2010 ◽
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pp. 608-613
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2000 ◽
Vol 379
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pp. 259-264
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Vol 24
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pp. 1435-1441
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pp. 433-444
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pp. 883
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