Growth behavior and surface morphology of Ag rough thin films deposited on silicone oil surfaces

Magnesium hydroxide (Mg(OH)2) thin films were deposited by the drop-dry deposition (DDD) method using an aqueous solution containing Mg(NO3)2 and NaOH. DDD was performed by dropping the solution on a substrate, heating-drying, and rinsing in water. Effects of different deposition conditions on the surface morphology and optical properties of Mg(OH)2 thin films were researched. Films with a thickness of 1−2 μm were successfully deposited, and the Raman peaks of Mg(OH)2 were observed for them. Their transmittance in the visible range was 95% or more, and the bandgap was about 5.8 eV. It was found that the thin films have resistivity of the order of 105 Ωcm. Thus, the transparent and semiconducting Mg(OH)2 thin films were successfully prepared by DDD.

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Surface morphology and optical properties of Ca and Mn doped TiO2 nano-structured thin films

Engineering Science and Technology an International Journal ◽

10.1016/j.jestch.2021.05.006 ◽

2021 ◽

Author(s):

Ugur Caligulu ◽

Nida Darcan ◽

Haluk Kejanli

Keyword(s):

Thin Films ◽

Optical Properties ◽

Surface Morphology ◽

Doped Tio2 ◽

Mn Doped

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Atypical Deposition Temperature of CZTS Thin Films in Spray-Pyrolysis Technique: Impact on Surface Morphology, Phase, and Chemical Composition

2020 IEEE KhPI Week on Advanced Technology (KhPIWeek) ◽

10.1109/khpiweek51551.2020.9250127 ◽

2020 ◽

Author(s):

A. Shamardin ◽

D. Kurbatov ◽

J. Kovac

Keyword(s):

Thin Films ◽

Chemical Composition ◽

Surface Morphology ◽

Spray Pyrolysis ◽

Deposition Temperature ◽

Spray Pyrolysis Technique ◽

Phase And Chemical Composition ◽

Czts Thin Films

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Influence of the Substrate Type on the Surface Morphology of Cu2ZnSnSe4 Thin Films

Journal of Surface Investigation X-ray Synchrotron and Neutron Techniques ◽

10.1134/s1027451018050415 ◽

2018 ◽

Vol 12 (6) ◽

pp. 1077-1081

Author(s):

S. M. Baraishuk ◽

T. M. Tkachenko ◽

A. V. Stanchik ◽

V. F. Gremenok ◽

S. A. Bashkirov ◽

...

Keyword(s):

Thin Films ◽

Surface Morphology ◽

Substrate Type

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Influence of Momentary Annealing on the Nanoscale Surface Morphology of Room Temperature Pulsed Laser Deposited NiO(111) Epitaxial Thin Films on Atomically Stepped Sapphire (0001) Substrates

MRS Proceedings ◽

10.1557/opl.2013.380 ◽

2013 ◽

Vol 1507 ◽

Author(s):

Ryosuke Yamauchi ◽

Geng Tan ◽

Daishi Shiojiri ◽

Nobuo Tsuchimine ◽

Koji Koyama ◽

...

Keyword(s):

Thin Films ◽

Surface Morphology ◽

Room Temperature ◽

Pulsed Laser ◽

Film Surface ◽

Transient State ◽

Epitaxial Thin Films ◽

Flat Surfaces ◽

Surface Nanostructure ◽

Atomically Flat

ABSTRACTWe examined the influence of momentary annealing on the nanoscale surface morphology of NiO(111) epitaxial thin films deposited on atomically stepped sapphire (0001) substrates at room temperature in O2 at 1.3 × 10−3 and 1.3 × 10−6 Pa using a pulsed laser deposition (PLD) technique. The NiO films have atomically flat surfaces (RMS roughness: approximately 0.1–0.2 nm) reflecting the step-and-terrace structures of the substrates, regardless of the O2 deposition pressure. After rapid thermal annealing (RTA) of the NiO(111) epitaxial film deposited at 1.3 × 10−3 Pa O2, a periodic straight nanogroove array related to the atomic steps of the substrate was formed on the film surface for 60 s. In contrast, the fabrication of a transient state in the nanogroove array formation was achieved with RTA of less than 1 s. However, when the O2 atmosphere during PLD was 1.3 × 10−6 Pa, random crystal growth was observed and resulted in a disordered rough surface nanostructure after RTA.

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