Dielectric breakdown caused by hole-induced-defect in thin SiO2 films

1997 ◽  
Vol 117-118 ◽  
pp. 245-248 ◽  
Author(s):  
Akinobu Teramoto ◽  
Kiyoteru Kobayashi ◽  
Yasuji Matsui ◽  
Makoto Hirayama
Keyword(s):  
Dielectric Breakdown ◽  
Sio2 Films

Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition

2013 ◽  
Vol 61 (20) ◽  
pp. 7660-7670 ◽  
Author(s):  
Takane Usui ◽  
Christine A. Donnelly ◽  
Manca Logar ◽  
Robert Sinclair ◽  
Joop Schoonman ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Dielectric Breakdown ◽  
Atomic Layer ◽  
Sio2 Films ◽  
Layer Deposition

Time-dependent dielectric breakdown of SiO2 films in a wide electric field range

2001 ◽  
Vol 41 (1) ◽  
pp. 47-52 ◽  
Author(s):  
A Teramoto ◽  
H Umeda ◽  
K Azamawari ◽  
K Kobayashi ◽  
K Shiga ◽  
...  
Keyword(s):  
Electric Field ◽  
Dielectric Breakdown ◽  
Time Dependent ◽  
Field Range ◽  
Sio2 Films ◽  
Time Dependent Dielectric Breakdown

Atomic force microscope topographical artifacts after the dielectric breakdown of ultrathin SiO2 films

2003 ◽  
Vol 532-535 ◽  
pp. 727-731 ◽  
Author(s):  
M. Porti ◽  
M. Nafrı́a ◽  
M.C. Blüm ◽  
X. Aymerich ◽  
S. Sadewasser
Keyword(s):  
Atomic Force Microscope ◽  
Dielectric Breakdown ◽  
Sio2 Films ◽  
Atomic Force
Sign in / Sign up

Export Citation Format

Share Document